JPS6442879A - Manufacture of semiconductor light-emitting element - Google Patents

Manufacture of semiconductor light-emitting element

Info

Publication number
JPS6442879A
JPS6442879A JP19942687A JP19942687A JPS6442879A JP S6442879 A JPS6442879 A JP S6442879A JP 19942687 A JP19942687 A JP 19942687A JP 19942687 A JP19942687 A JP 19942687A JP S6442879 A JPS6442879 A JP S6442879A
Authority
JP
Japan
Prior art keywords
inp
type
stopping layer
saturation
current stopping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19942687A
Other languages
Japanese (ja)
Inventor
Yasushi Sakakibara
Katsuhiko Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP19942687A priority Critical patent/JPS6442879A/en
Publication of JPS6442879A publication Critical patent/JPS6442879A/en
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To realize an internal current constriction type semiconductor light- emitting element high in reproducibility and performance in a single crystal growing process by a method wherein a part of a current stopping layer formed on a substrate mounted with a mesa is converted into the P type by diffusion in a just saturation melt process. CONSTITUTION:For conversion of an N-InP current stopping layer 3 into the P type, a high-concentration just saturation P-InP melt process is resorted to for impurity diffusion. The high-concentration just saturation P-InP melt process is high in controllability in converting a part of the N-InP current stopping layer 3 into the P-type, and will not be a source of impurity atoms that may contaminate an active layer 6 because there will hardly be crystal growth on a wafer. As the result, carrier concentrations may be set as desired for the N-InP current stopping layer 3 and a P-InP clad layer 5, which ensures easy optimization for devices. This means that an internal current constriction type LED highly efficient in surface emission may be constructed in one crystal growth process.
JP19942687A 1987-08-10 1987-08-10 Manufacture of semiconductor light-emitting element Pending JPS6442879A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19942687A JPS6442879A (en) 1987-08-10 1987-08-10 Manufacture of semiconductor light-emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19942687A JPS6442879A (en) 1987-08-10 1987-08-10 Manufacture of semiconductor light-emitting element

Publications (1)

Publication Number Publication Date
JPS6442879A true JPS6442879A (en) 1989-02-15

Family

ID=16407614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19942687A Pending JPS6442879A (en) 1987-08-10 1987-08-10 Manufacture of semiconductor light-emitting element

Country Status (1)

Country Link
JP (1) JPS6442879A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6549553B1 (en) 1998-02-25 2003-04-15 Nippon Telegraph And Telephone Corporation Vertical-cavity surface-emitting semiconductor laser

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6549553B1 (en) 1998-02-25 2003-04-15 Nippon Telegraph And Telephone Corporation Vertical-cavity surface-emitting semiconductor laser
US6846685B2 (en) 1998-02-25 2005-01-25 Nippon Telegraph And Telephone Corporation Vertical-cavity surface-emitting semiconductor laser

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