JPS5534482A - Manufacturing method for semiconductor laser - Google Patents
Manufacturing method for semiconductor laserInfo
- Publication number
- JPS5534482A JPS5534482A JP10779578A JP10779578A JPS5534482A JP S5534482 A JPS5534482 A JP S5534482A JP 10779578 A JP10779578 A JP 10779578A JP 10779578 A JP10779578 A JP 10779578A JP S5534482 A JPS5534482 A JP S5534482A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- active layer
- grown
- type gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE: To obtain rib guide stripe type semiconductor laser of excellent reliability, by growing active layer and the layer above thereof in the second stage, securing layer whereinto sides of active layer are buried utilizing aqueous phase epitaxial growth method in the first stage.
CONSTITUTION: Utilizing the first aqueous phase epitaxial method, n-type Al0.3 Ga0.7As layer 9, p-type GaAs layer (active layer) 10, p-type Al0.3Ga0.7As layer 11 are grown in this order in succession on the n-type GaAs semiconductor substrate 8. After forming SiO2 layer 19 on the above mentioned p-type layer 11, stripe form etching groove is established by etching p-type layer 11 selectively with depth reaching the surface of p-type GaAs layer 10. Employing solution which helps in growing active layer, p-type layer 10 is melted back until reaching n-type layer 9 in hydrogen gas atmosphere. Then, at the same time when melting back process is finished, p-type GaAs layer 12, p-type Al0.3Ga0.7As layer 13 is grown in succession again, and crystal surface, together with the active layer which is thicker than the active layer initially grown are made into evenness.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10779578A JPS5534482A (en) | 1978-09-01 | 1978-09-01 | Manufacturing method for semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10779578A JPS5534482A (en) | 1978-09-01 | 1978-09-01 | Manufacturing method for semiconductor laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5534482A true JPS5534482A (en) | 1980-03-11 |
JPS613116B2 JPS613116B2 (en) | 1986-01-30 |
Family
ID=14468216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10779578A Granted JPS5534482A (en) | 1978-09-01 | 1978-09-01 | Manufacturing method for semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5534482A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60501634A (en) * | 1983-06-17 | 1985-09-26 | ア−ルシ−エ− コ−ポレ−ション | Method for manufacturing laser array with flat active layer |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0627263U (en) * | 1992-09-18 | 1994-04-12 | 西川ゴム工業株式会社 | Door weather strip |
-
1978
- 1978-09-01 JP JP10779578A patent/JPS5534482A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60501634A (en) * | 1983-06-17 | 1985-09-26 | ア−ルシ−エ− コ−ポレ−ション | Method for manufacturing laser array with flat active layer |
JPH0573075B2 (en) * | 1983-06-17 | 1993-10-13 | Rca Corp |
Also Published As
Publication number | Publication date |
---|---|
JPS613116B2 (en) | 1986-01-30 |
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