JPS56103444A - Production of element isolation structure for semiconductor device - Google Patents

Production of element isolation structure for semiconductor device

Info

Publication number
JPS56103444A
JPS56103444A JP557480A JP557480A JPS56103444A JP S56103444 A JPS56103444 A JP S56103444A JP 557480 A JP557480 A JP 557480A JP 557480 A JP557480 A JP 557480A JP S56103444 A JPS56103444 A JP S56103444A
Authority
JP
Japan
Prior art keywords
sio2
film
poly
removal
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP557480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6310897B2 (index.php
Inventor
Toshiyuki Ishijima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP557480A priority Critical patent/JPS56103444A/ja
Publication of JPS56103444A publication Critical patent/JPS56103444A/ja
Publication of JPS6310897B2 publication Critical patent/JPS6310897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/0126—
    • H10W10/0121—
    • H10W10/13—

Landscapes

  • Element Separation (AREA)
  • Local Oxidation Of Silicon (AREA)
JP557480A 1980-01-21 1980-01-21 Production of element isolation structure for semiconductor device Granted JPS56103444A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP557480A JPS56103444A (en) 1980-01-21 1980-01-21 Production of element isolation structure for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP557480A JPS56103444A (en) 1980-01-21 1980-01-21 Production of element isolation structure for semiconductor device

Publications (2)

Publication Number Publication Date
JPS56103444A true JPS56103444A (en) 1981-08-18
JPS6310897B2 JPS6310897B2 (index.php) 1988-03-10

Family

ID=11614985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP557480A Granted JPS56103444A (en) 1980-01-21 1980-01-21 Production of element isolation structure for semiconductor device

Country Status (1)

Country Link
JP (1) JPS56103444A (index.php)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4818235A (en) * 1987-02-10 1989-04-04 Industry Technology Research Institute Isolation structures for integrated circuits
US4980311A (en) * 1987-05-05 1990-12-25 Seiko Epson Corporation Method of fabricating a semiconductor device
US5385861A (en) * 1994-03-15 1995-01-31 National Semiconductor Corporation Planarized trench and field oxide and poly isolation scheme

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4818235A (en) * 1987-02-10 1989-04-04 Industry Technology Research Institute Isolation structures for integrated circuits
US4980311A (en) * 1987-05-05 1990-12-25 Seiko Epson Corporation Method of fabricating a semiconductor device
US5385861A (en) * 1994-03-15 1995-01-31 National Semiconductor Corporation Planarized trench and field oxide and poly isolation scheme

Also Published As

Publication number Publication date
JPS6310897B2 (index.php) 1988-03-10

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