JPS5568650A - Manufacturing method of semiconductor device - Google Patents
Manufacturing method of semiconductor deviceInfo
- Publication number
- JPS5568650A JPS5568650A JP14237378A JP14237378A JPS5568650A JP S5568650 A JPS5568650 A JP S5568650A JP 14237378 A JP14237378 A JP 14237378A JP 14237378 A JP14237378 A JP 14237378A JP S5568650 A JPS5568650 A JP S5568650A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- arrangement
- thin
- under self
- channel stopper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Formation Of Insulating Films (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Recrystallisation Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14237378A JPS5568650A (en) | 1978-11-20 | 1978-11-20 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14237378A JPS5568650A (en) | 1978-11-20 | 1978-11-20 | Manufacturing method of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5568650A true JPS5568650A (en) | 1980-05-23 |
JPS6211504B2 JPS6211504B2 (ja) | 1987-03-12 |
Family
ID=15313863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14237378A Granted JPS5568650A (en) | 1978-11-20 | 1978-11-20 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5568650A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0489414U (ja) * | 1991-09-25 | 1992-08-05 | ||
US5795809A (en) * | 1995-05-25 | 1998-08-18 | Advanced Micro Devices, Inc. | Semiconductor wafer fabrication process including gettering utilizing a combined oxidation technique |
-
1978
- 1978-11-20 JP JP14237378A patent/JPS5568650A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0489414U (ja) * | 1991-09-25 | 1992-08-05 | ||
US5795809A (en) * | 1995-05-25 | 1998-08-18 | Advanced Micro Devices, Inc. | Semiconductor wafer fabrication process including gettering utilizing a combined oxidation technique |
Also Published As
Publication number | Publication date |
---|---|
JPS6211504B2 (ja) | 1987-03-12 |
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