JPS5563826A - Pattern exposure device - Google Patents

Pattern exposure device

Info

Publication number
JPS5563826A
JPS5563826A JP13824878A JP13824878A JPS5563826A JP S5563826 A JPS5563826 A JP S5563826A JP 13824878 A JP13824878 A JP 13824878A JP 13824878 A JP13824878 A JP 13824878A JP S5563826 A JPS5563826 A JP S5563826A
Authority
JP
Japan
Prior art keywords
wafer
mask
connection
discharged
prevented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13824878A
Other languages
Japanese (ja)
Inventor
Keiichi Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13824878A priority Critical patent/JPS5563826A/en
Publication of JPS5563826A publication Critical patent/JPS5563826A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To remove oxygen exactly from the connection between a wafer and a mask and maintain pattern transfer precision, by making the gas being discharged from the connection between a wafer coated with a photosensitive material and a mask into a spiral stream.
CONSTITUTION: Wafer 2 coated with a photosensitive material is mounted on seat 1a of table 1, and mask 5 is supported by holder 3 so as to cover hole 4 of table 1. By raising table 1, the distance between wafer 2 and mask 5 is fixed, and nitrogen is supplied to collecting path 6, and it is discharged from ejection path 7 as shown in the drawing. Thus, it is made into a spiral stream on the upper surface of wafer 2, being prevented to become a wild stream. By this, the intrusion of oxygen from the surrounding areas is prevented, and it is possible to remove oxygen exactly from the connection between the wafer and the mask and to transfer the pattern with high precision.
COPYRIGHT: (C)1980,JPO&Japio
JP13824878A 1978-11-09 1978-11-09 Pattern exposure device Pending JPS5563826A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13824878A JPS5563826A (en) 1978-11-09 1978-11-09 Pattern exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13824878A JPS5563826A (en) 1978-11-09 1978-11-09 Pattern exposure device

Publications (1)

Publication Number Publication Date
JPS5563826A true JPS5563826A (en) 1980-05-14

Family

ID=15217519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13824878A Pending JPS5563826A (en) 1978-11-09 1978-11-09 Pattern exposure device

Country Status (1)

Country Link
JP (1) JPS5563826A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03272127A (en) * 1990-03-22 1991-12-03 Hitachi Electron Eng Co Ltd Substrate exposure device
JP2001168027A (en) * 1999-11-05 2001-06-22 Asm Lithography Bv Lithography device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03272127A (en) * 1990-03-22 1991-12-03 Hitachi Electron Eng Co Ltd Substrate exposure device
JP2001168027A (en) * 1999-11-05 2001-06-22 Asm Lithography Bv Lithography device

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