JPS5371570A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS5371570A
JPS5371570A JP14663576A JP14663576A JPS5371570A JP S5371570 A JPS5371570 A JP S5371570A JP 14663576 A JP14663576 A JP 14663576A JP 14663576 A JP14663576 A JP 14663576A JP S5371570 A JPS5371570 A JP S5371570A
Authority
JP
Japan
Prior art keywords
exposure device
copy
charging
inert gas
infrared rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14663576A
Other languages
Japanese (ja)
Inventor
Yasuaki Nakane
Tadayoshi Mifune
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP14663576A priority Critical patent/JPS5371570A/en
Publication of JPS5371570A publication Critical patent/JPS5371570A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Abstract

PURPOSE: To copy a minute pattern at high precision by means of near vacuum infrared rays by charging an inert gas in a lamp container and the cylinder provided being connected to it.
COPYRIGHT: (C)1978,JPO&Japio
JP14663576A 1976-12-08 1976-12-08 Exposure device Pending JPS5371570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14663576A JPS5371570A (en) 1976-12-08 1976-12-08 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14663576A JPS5371570A (en) 1976-12-08 1976-12-08 Exposure device

Publications (1)

Publication Number Publication Date
JPS5371570A true JPS5371570A (en) 1978-06-26

Family

ID=15412176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14663576A Pending JPS5371570A (en) 1976-12-08 1976-12-08 Exposure device

Country Status (1)

Country Link
JP (1) JPS5371570A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60133728A (en) * 1983-12-21 1985-07-16 Seiko Epson Corp Far ultraviolet ray projecting exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60133728A (en) * 1983-12-21 1985-07-16 Seiko Epson Corp Far ultraviolet ray projecting exposure device

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