JPS5228874A - Mask holder - Google Patents

Mask holder

Info

Publication number
JPS5228874A
JPS5228874A JP10411575A JP10411575A JPS5228874A JP S5228874 A JPS5228874 A JP S5228874A JP 10411575 A JP10411575 A JP 10411575A JP 10411575 A JP10411575 A JP 10411575A JP S5228874 A JPS5228874 A JP S5228874A
Authority
JP
Japan
Prior art keywords
mask holder
mask
maskholder
shut
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10411575A
Other languages
Japanese (ja)
Inventor
Nobuya Shinoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP10411575A priority Critical patent/JPS5228874A/en
Publication of JPS5228874A publication Critical patent/JPS5228874A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Abstract

PURPOSE: To shut off the light on the marked region by the filter for ultraviolet rays and to make a maskholder which is coupled to the mask exactly.
COPYRIGHT: (C)1977,JPO&Japio
JP10411575A 1975-08-29 1975-08-29 Mask holder Pending JPS5228874A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10411575A JPS5228874A (en) 1975-08-29 1975-08-29 Mask holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10411575A JPS5228874A (en) 1975-08-29 1975-08-29 Mask holder

Publications (1)

Publication Number Publication Date
JPS5228874A true JPS5228874A (en) 1977-03-04

Family

ID=14372115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10411575A Pending JPS5228874A (en) 1975-08-29 1975-08-29 Mask holder

Country Status (1)

Country Link
JP (1) JPS5228874A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187632A (en) * 1987-01-30 1988-08-03 Nec Corp Manufacture of semiconductor element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187632A (en) * 1987-01-30 1988-08-03 Nec Corp Manufacture of semiconductor element

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