JPS5558569A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5558569A JPS5558569A JP13138078A JP13138078A JPS5558569A JP S5558569 A JPS5558569 A JP S5558569A JP 13138078 A JP13138078 A JP 13138078A JP 13138078 A JP13138078 A JP 13138078A JP S5558569 A JPS5558569 A JP S5558569A
- Authority
- JP
- Japan
- Prior art keywords
- contact hole
- resist mask
- ohmic
- resist
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Bipolar Transistors (AREA)
Abstract
PURPOSE: To obtain a fine-pattern ohmic-contact hole, by etching and removing thin parts of an oxide film by using a resist mask, and retaining thick parts, and then opening the thick parts by laminating resist masks.
CONSTITUTION: Extremely thin resist mask 51 is provided on base plate 1, on which base 3, emitter 4 and SiO2 2 have been formed. Etching is stopped in the condition where thin parts (ohmic-contact hole) of film 2 are completely opened (71). After resist 51 is heat treated; by providing resist mask 52 again, the remaining part of film 2 is opened (61). Since the resist mask at this time is of two-layers, the appearance of pinholes due to eching is very small. The mask is removed, and electrodes 91, 92 are fitted. By this structure, the contact hole of the thin oxide film part is etched sideways and does not expand to the neighborhood of the base-emitter junction. As a result, a stabilized ohmic-contact hole is formed.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13138078A JPS5558569A (en) | 1978-10-24 | 1978-10-24 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13138078A JPS5558569A (en) | 1978-10-24 | 1978-10-24 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5558569A true JPS5558569A (en) | 1980-05-01 |
Family
ID=15056587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13138078A Pending JPS5558569A (en) | 1978-10-24 | 1978-10-24 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5558569A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5793569A (en) * | 1980-12-03 | 1982-06-10 | Fujitsu Ltd | Manufacture of semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4940062A (en) * | 1972-07-13 | 1974-04-15 | Intersil Inc |
-
1978
- 1978-10-24 JP JP13138078A patent/JPS5558569A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4940062A (en) * | 1972-07-13 | 1974-04-15 | Intersil Inc |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5793569A (en) * | 1980-12-03 | 1982-06-10 | Fujitsu Ltd | Manufacture of semiconductor device |
JPH0230575B2 (en) * | 1980-12-03 | 1990-07-06 | Fujitsu Ltd |
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