JPS5544752A - Manufacture of multilayer wiring type semiconductor - Google Patents

Manufacture of multilayer wiring type semiconductor

Info

Publication number
JPS5544752A
JPS5544752A JP11822078A JP11822078A JPS5544752A JP S5544752 A JPS5544752 A JP S5544752A JP 11822078 A JP11822078 A JP 11822078A JP 11822078 A JP11822078 A JP 11822078A JP S5544752 A JPS5544752 A JP S5544752A
Authority
JP
Japan
Prior art keywords
film
photo
range
films
layer wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11822078A
Other languages
Japanese (ja)
Inventor
Masaru Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11822078A priority Critical patent/JPS5544752A/en
Publication of JPS5544752A publication Critical patent/JPS5544752A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To make holes uniformly with one mask pattern on the through-hole range of nonporous alumina film and interlayer insulating film and to prevent the cutting of upper-layer wiring by inhibiting galvanic action by means of the photo- resist film on the reverse side of the films.
CONSTITUTION: Al film 4 is bonded to a semiconductor device having a semiconductor substrate 1, main insulating film 2 and diffused element range 3, and the surface thereof is changed into nonporous alumina film 5. Next, photo- resist film 6 is provided on the range to be formed the first layer wiring, and the range except the wiring is separated with porous alumina film. Next, the film 6 is removed, interlayer insulating film 8 is coated, and the film 9 is provided by coating Si oxide application liquid. Next, the reverse side of the semiconductor substrate 1 is coated with photo-resist film 10. Next, a hole pattern 11 of the photo-resist film is provided. Next, films 8 and 5 are simultaneously chemically etched. At this time, the corrosion speed of the film 9 is so high that the side face of the holes of the film 8 become inclined. Further, galvanic action is inhibited by the film 10. Next, the films 10 and 11 are removed, and upper-layer wiring 13 is provided in contact with through-hole portion.
COPYRIGHT: (C)1980,JPO&Japio
JP11822078A 1978-09-25 1978-09-25 Manufacture of multilayer wiring type semiconductor Pending JPS5544752A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11822078A JPS5544752A (en) 1978-09-25 1978-09-25 Manufacture of multilayer wiring type semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11822078A JPS5544752A (en) 1978-09-25 1978-09-25 Manufacture of multilayer wiring type semiconductor

Publications (1)

Publication Number Publication Date
JPS5544752A true JPS5544752A (en) 1980-03-29

Family

ID=14731185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11822078A Pending JPS5544752A (en) 1978-09-25 1978-09-25 Manufacture of multilayer wiring type semiconductor

Country Status (1)

Country Link
JP (1) JPS5544752A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57145873A (en) * 1981-09-28 1982-09-09 Takeda Chem Ind Ltd Production of furfural derivative

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57145873A (en) * 1981-09-28 1982-09-09 Takeda Chem Ind Ltd Production of furfural derivative
JPS5852995B2 (en) * 1981-09-28 1983-11-26 武田薬品工業株式会社 Method for producing furfural derivatives

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