JPS57176729A - Forming method for pattern - Google Patents

Forming method for pattern

Info

Publication number
JPS57176729A
JPS57176729A JP6290481A JP6290481A JPS57176729A JP S57176729 A JPS57176729 A JP S57176729A JP 6290481 A JP6290481 A JP 6290481A JP 6290481 A JP6290481 A JP 6290481A JP S57176729 A JPS57176729 A JP S57176729A
Authority
JP
Japan
Prior art keywords
pattern
film
layer
wet etching
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6290481A
Other languages
Japanese (ja)
Inventor
Haruyuki Hoshika
Kyohiko Kotani
Hirozo Takano
Yoji Masuko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6290481A priority Critical patent/JPS57176729A/en
Publication of JPS57176729A publication Critical patent/JPS57176729A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

Abstract

PURPOSE:To obtain a pattern having no irregular wet etching by selectively removing an insulating film of upper layer of the insulating layer laminated on a semiconductor substrate and covering the all surface of the substrate with a hydrophilic and water soluble organic substance. CONSTITUTION:A resist film pattern 4 is formed on the first layer insulating film 2 and second layer insulating films 3 laminated on a semiconductor substrate 1, the film 3 is selectively removed using the pattern 4 as a mask, and a thin film layer 5 made a of hydrophilic and water soluble organic substance is formed on the overall surface of the substrate 1, thereby forming a desired pattern by wet etching at the film 2. In this manner, the etchant is immersed upto the surface of the film 2 even in fine pattern, thereby performing wet etching without irregularity.
JP6290481A 1981-04-23 1981-04-23 Forming method for pattern Pending JPS57176729A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6290481A JPS57176729A (en) 1981-04-23 1981-04-23 Forming method for pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6290481A JPS57176729A (en) 1981-04-23 1981-04-23 Forming method for pattern

Publications (1)

Publication Number Publication Date
JPS57176729A true JPS57176729A (en) 1982-10-30

Family

ID=13213700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6290481A Pending JPS57176729A (en) 1981-04-23 1981-04-23 Forming method for pattern

Country Status (1)

Country Link
JP (1) JPS57176729A (en)

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