JPS5538085A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5538085A JPS5538085A JP11207678A JP11207678A JPS5538085A JP S5538085 A JPS5538085 A JP S5538085A JP 11207678 A JP11207678 A JP 11207678A JP 11207678 A JP11207678 A JP 11207678A JP S5538085 A JPS5538085 A JP S5538085A
- Authority
- JP
- Japan
- Prior art keywords
- opening
- film
- emulsion type
- resin
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To diffuse impurities correctly only through specified openings by forming a protective film on a intermediate film which acts to smooth unevenness, in order to diffuse impurities through an opening on an insulation film formed on a semiconductor substrate.
CONSTITUTION: An insulation film 22 and openings 23,24 are formed on a substrate 21. Emulsion type oxides, for example, are coated, the coated film on the film 22 is removed and the specified opening 23 is closed by photosensitive resin 25. Then the emulsion type oxide 26 in the opening 24 is removed using resin 25 as a protective film and then the resin is removed, the emulsion type oxide 27 in the opening 23 is allowed to remain and impurities are introduced only into the opening 24 by the ion injection method.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11207678A JPS5538085A (en) | 1978-09-11 | 1978-09-11 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11207678A JPS5538085A (en) | 1978-09-11 | 1978-09-11 | Production of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5538085A true JPS5538085A (en) | 1980-03-17 |
JPS6210007B2 JPS6210007B2 (en) | 1987-03-04 |
Family
ID=14577462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11207678A Granted JPS5538085A (en) | 1978-09-11 | 1978-09-11 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5538085A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007141940A (en) * | 2005-11-15 | 2007-06-07 | Nissan Motor Co Ltd | Method of manufacturing composite impurity structure, semiconductor device, mosfet transistor, and insulated gate bipolar transistor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01242111A (en) * | 1988-03-23 | 1989-09-27 | Kurita Mach Mfg Co Ltd | Hanging device for filter medium in filter press |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50138769A (en) * | 1974-04-23 | 1975-11-05 | ||
JPS5391676A (en) * | 1977-01-24 | 1978-08-11 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
-
1978
- 1978-09-11 JP JP11207678A patent/JPS5538085A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50138769A (en) * | 1974-04-23 | 1975-11-05 | ||
JPS5391676A (en) * | 1977-01-24 | 1978-08-11 | Matsushita Electric Ind Co Ltd | Manufacture for semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007141940A (en) * | 2005-11-15 | 2007-06-07 | Nissan Motor Co Ltd | Method of manufacturing composite impurity structure, semiconductor device, mosfet transistor, and insulated gate bipolar transistor |
Also Published As
Publication number | Publication date |
---|---|
JPS6210007B2 (en) | 1987-03-04 |
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