JPS55163846A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS55163846A JPS55163846A JP7085679A JP7085679A JPS55163846A JP S55163846 A JPS55163846 A JP S55163846A JP 7085679 A JP7085679 A JP 7085679A JP 7085679 A JP7085679 A JP 7085679A JP S55163846 A JPS55163846 A JP S55163846A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- electron beam
- insulating film
- wiring layer
- metallic wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7085679A JPS55163846A (en) | 1979-06-06 | 1979-06-06 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7085679A JPS55163846A (en) | 1979-06-06 | 1979-06-06 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55163846A true JPS55163846A (en) | 1980-12-20 |
JPS6138852B2 JPS6138852B2 (enrdf_load_stackoverflow) | 1986-09-01 |
Family
ID=13443618
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7085679A Granted JPS55163846A (en) | 1979-06-06 | 1979-06-06 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55163846A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56500911A (enrdf_load_stackoverflow) * | 1979-07-24 | 1981-07-02 | ||
JPS63146449A (ja) * | 1986-12-10 | 1988-06-18 | Sharp Corp | 半導体装置の製造方法 |
-
1979
- 1979-06-06 JP JP7085679A patent/JPS55163846A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56500911A (enrdf_load_stackoverflow) * | 1979-07-24 | 1981-07-02 | ||
JPS63146449A (ja) * | 1986-12-10 | 1988-06-18 | Sharp Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6138852B2 (enrdf_load_stackoverflow) | 1986-09-01 |
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