JPS55153344A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS55153344A
JPS55153344A JP6123379A JP6123379A JPS55153344A JP S55153344 A JPS55153344 A JP S55153344A JP 6123379 A JP6123379 A JP 6123379A JP 6123379 A JP6123379 A JP 6123379A JP S55153344 A JPS55153344 A JP S55153344A
Authority
JP
Japan
Prior art keywords
layer
fabricated
emitter
sio2 film
isolation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6123379A
Other languages
English (en)
Other versions
JPS6129539B2 (ja
Inventor
Takeshi Fukuda
Tsutomu Akatsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6123379A priority Critical patent/JPS55153344A/ja
Publication of JPS55153344A publication Critical patent/JPS55153344A/ja
Publication of JPS6129539B2 publication Critical patent/JPS6129539B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/763—Polycrystalline semiconductor regions

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)
JP6123379A 1979-05-18 1979-05-18 Manufacture of semiconductor device Granted JPS55153344A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6123379A JPS55153344A (en) 1979-05-18 1979-05-18 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6123379A JPS55153344A (en) 1979-05-18 1979-05-18 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS55153344A true JPS55153344A (en) 1980-11-29
JPS6129539B2 JPS6129539B2 (ja) 1986-07-07

Family

ID=13165292

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6123379A Granted JPS55153344A (en) 1979-05-18 1979-05-18 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS55153344A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818962A (ja) * 1981-07-27 1983-02-03 Toshiba Corp 半導体装置
JPS5980967A (ja) * 1982-11-01 1984-05-10 Hitachi Ltd 半導体装置の製造方法
JPS6037775A (ja) * 1983-07-05 1985-02-27 フエアチアイルド　カメラ　アンド　インストルメント　コーポレーシヨン 集積回路構成体の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958792A (ja) * 1972-10-04 1974-06-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4958792A (ja) * 1972-10-04 1974-06-07

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5818962A (ja) * 1981-07-27 1983-02-03 Toshiba Corp 半導体装置
JPH0130309B2 (ja) * 1981-07-27 1989-06-19 Tokyo Shibaura Electric Co
JPS5980967A (ja) * 1982-11-01 1984-05-10 Hitachi Ltd 半導体装置の製造方法
JPS6037775A (ja) * 1983-07-05 1985-02-27 フエアチアイルド　カメラ　アンド　インストルメント　コーポレーシヨン 集積回路構成体の製造方法

Also Published As

Publication number Publication date
JPS6129539B2 (ja) 1986-07-07

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