JPS55135410A - Sealing method for surface wave device - Google Patents
Sealing method for surface wave deviceInfo
- Publication number
- JPS55135410A JPS55135410A JP4343679A JP4343679A JPS55135410A JP S55135410 A JPS55135410 A JP S55135410A JP 4343679 A JP4343679 A JP 4343679A JP 4343679 A JP4343679 A JP 4343679A JP S55135410 A JPS55135410 A JP S55135410A
- Authority
- JP
- Japan
- Prior art keywords
- surface wave
- gap
- volatile
- propagation line
- wave device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
PURPOSE:To form the gap on the propagation line of the surface wave without using any protective cap or the like, by coating the volatile low fusing point material on the substrate surface and molding them and then dispersing the volatile gas. CONSTITUTION:The surface wave device in which transmission and reception electrodes 2 and 3 are provided on substrate 1 is die-bonded to mount plate 5. Volatile material 9 of paraffin or the like is coated on the propagation line of the surface wave and then molded with the porous resin such as the phenol resin or the like. After this, the heating is given in the vacuum atmosphere, and as a result the volatile gas is dispersed through porous molded substance 8. In such way, the gap is formed on the propagation line. The molded substance doubles the absorber of the surface wave. In such process of gap formation, no use of the protective cap is required to reduce the working process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4343679A JPS55135410A (en) | 1979-04-09 | 1979-04-09 | Sealing method for surface wave device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4343679A JPS55135410A (en) | 1979-04-09 | 1979-04-09 | Sealing method for surface wave device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55135410A true JPS55135410A (en) | 1980-10-22 |
JPS6235286B2 JPS6235286B2 (en) | 1987-07-31 |
Family
ID=12663638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4343679A Granted JPS55135410A (en) | 1979-04-09 | 1979-04-09 | Sealing method for surface wave device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55135410A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996930U (en) * | 1982-12-21 | 1984-06-30 | 松下電器産業株式会社 | surface acoustic wave device |
JP2009021333A (en) * | 2007-07-11 | 2009-01-29 | Nec Electronics Corp | Method of manufacturing optical coupling apparatus, and optical coupling apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4933236A (en) * | 1972-07-28 | 1974-03-27 | ||
JPS5178993A (en) * | 1974-12-30 | 1976-07-09 | Matsushita Electric Ind Co Ltd | DANSEIHYOMENHADEBAISUNO SEIZOHOHO |
-
1979
- 1979-04-09 JP JP4343679A patent/JPS55135410A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4933236A (en) * | 1972-07-28 | 1974-03-27 | ||
JPS5178993A (en) * | 1974-12-30 | 1976-07-09 | Matsushita Electric Ind Co Ltd | DANSEIHYOMENHADEBAISUNO SEIZOHOHO |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5996930U (en) * | 1982-12-21 | 1984-06-30 | 松下電器産業株式会社 | surface acoustic wave device |
JP2009021333A (en) * | 2007-07-11 | 2009-01-29 | Nec Electronics Corp | Method of manufacturing optical coupling apparatus, and optical coupling apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS6235286B2 (en) | 1987-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
UA32406C2 (en) | device for shaving by moist method, composite means facilitating shaving, and method of production THEREOF | |
JPS57195772A (en) | Method of coating base material and coating aqueous solution composition therefor | |
DE3564387D1 (en) | Process of coating a heated article using a sterically stabilised coating composition and compositions useful in the process | |
ES8303470A1 (en) | Process for applying a coating to a substrate. | |
DE3069160D1 (en) | Process for preparing resin impregnated substrates, resin impregnated substrate and electrical laminate therefrom | |
JPS55135410A (en) | Sealing method for surface wave device | |
JPS5730528A (en) | Vapor-separating member | |
GB2015989A (en) | Non-misting glass and process for producing the same | |
JPS53140973A (en) | Forming method of semiconductor insulation film | |
JPS5724112A (en) | Package construction for piezoelectric oscillating element and its forming method | |
JPS55125631A (en) | Coating of photoresist | |
JPS5728366A (en) | Semiconductor device | |
JPS5582679A (en) | Thin film type thermal head | |
EP0098985A3 (en) | Method of manufacturing an electrically insulating and thermally radiating silicone rubber sheet, and silicone rubber sheets made thereby | |
JPS56144505A (en) | Manufacture of magnetic material | |
JPS5275247A (en) | Ballistic surface wave unit | |
JPS54106171A (en) | Semiconductor device | |
JPS55117233A (en) | Semiconductor device and manufacturing thereof | |
JPS56105624A (en) | Manufacture of plate-type silicon crystal | |
JPS56134730A (en) | Production of thin film by sputtering | |
JPS57102011A (en) | Manufacture of amorphous semiconductor device | |
JPS56147452A (en) | Semiconductor device | |
JPS5667925A (en) | Plasma etching method | |
JPS5245592A (en) | Method of coating corrosion resistant substance on heating material | |
JPS56155395A (en) | Heat conductive surface |