JPS55130542A - Exposing method - Google Patents

Exposing method

Info

Publication number
JPS55130542A
JPS55130542A JP3790479A JP3790479A JPS55130542A JP S55130542 A JPS55130542 A JP S55130542A JP 3790479 A JP3790479 A JP 3790479A JP 3790479 A JP3790479 A JP 3790479A JP S55130542 A JPS55130542 A JP S55130542A
Authority
JP
Japan
Prior art keywords
mask
substrate
chamfered
resist
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3790479A
Other languages
Japanese (ja)
Inventor
Kenji Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3790479A priority Critical patent/JPS55130542A/en
Publication of JPS55130542A publication Critical patent/JPS55130542A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable a chamfered substrate and a chamfered mask to be easily separated by closely contacting the mask to the substrate to be treated and inserting wedges in the chamfered portions to separate them after exposure. CONSTITUTION:The resist-coated surface of substrate 2 to be treated is set opposite to mask 1, and mask 1 and substrate 2 are closely contacted by vacuum suction. In order to expose the resist, they are irradiated with ultraviolet rays from the mask 1 side. Wedge-form distance pieces 5 are then placed in previously chamfered portious 3, 4 of opposite edges of mask 1 and substrate 2, and by inserting pieces 5 in the arrow directions mask 1 and substrate 2 are separated. Suitable width l of portions 3, 4 is 1.5-2.5mm.
JP3790479A 1979-03-30 1979-03-30 Exposing method Pending JPS55130542A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3790479A JPS55130542A (en) 1979-03-30 1979-03-30 Exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3790479A JPS55130542A (en) 1979-03-30 1979-03-30 Exposing method

Publications (1)

Publication Number Publication Date
JPS55130542A true JPS55130542A (en) 1980-10-09

Family

ID=12510523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3790479A Pending JPS55130542A (en) 1979-03-30 1979-03-30 Exposing method

Country Status (1)

Country Link
JP (1) JPS55130542A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5321574A (en) * 1976-08-11 1978-02-28 Mitsubishi Electric Corp Contact and separation method of photo mask
JPS5434778A (en) * 1977-08-24 1979-03-14 Hitachi Ltd Mask aligner

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5321574A (en) * 1976-08-11 1978-02-28 Mitsubishi Electric Corp Contact and separation method of photo mask
JPS5434778A (en) * 1977-08-24 1979-03-14 Hitachi Ltd Mask aligner

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