JPS55130192A - Method of fabricating semiconductor light emitting device - Google Patents

Method of fabricating semiconductor light emitting device

Info

Publication number
JPS55130192A
JPS55130192A JP3822479A JP3822479A JPS55130192A JP S55130192 A JPS55130192 A JP S55130192A JP 3822479 A JP3822479 A JP 3822479A JP 3822479 A JP3822479 A JP 3822479A JP S55130192 A JPS55130192 A JP S55130192A
Authority
JP
Japan
Prior art keywords
proton
high resistance
light emitting
semiconductor light
clad layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3822479A
Other languages
English (en)
Inventor
Teruo Sakurai
Haruo Kawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3822479A priority Critical patent/JPS55130192A/ja
Publication of JPS55130192A publication Critical patent/JPS55130192A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054Methods of obtaining the confinement
    • H01S5/2059Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
    • H01S5/2063Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion obtained by particle bombardment

Landscapes

  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
JP3822479A 1979-03-30 1979-03-30 Method of fabricating semiconductor light emitting device Pending JPS55130192A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3822479A JPS55130192A (en) 1979-03-30 1979-03-30 Method of fabricating semiconductor light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3822479A JPS55130192A (en) 1979-03-30 1979-03-30 Method of fabricating semiconductor light emitting device

Publications (1)

Publication Number Publication Date
JPS55130192A true JPS55130192A (en) 1980-10-08

Family

ID=12519325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3822479A Pending JPS55130192A (en) 1979-03-30 1979-03-30 Method of fabricating semiconductor light emitting device

Country Status (1)

Country Link
JP (1) JPS55130192A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62226623A (ja) * 1986-03-27 1987-10-05 Nec Corp 半導体装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62226623A (ja) * 1986-03-27 1987-10-05 Nec Corp 半導体装置

Similar Documents

Publication Publication Date Title
EP0030370B1 (en) Ion implanted reverse-conducting thyristor
JPS55130192A (en) Method of fabricating semiconductor light emitting device
JPS5615035A (en) Manufacture of semiconductor device
JPS5587429A (en) Manufacture of semiconductor device
JPS5856481A (ja) ゲルマニウム受光素子の製造方法
JPS645063A (en) Hetero-junction bipolar transistor
JPS5539618A (en) Manufacturing of semiconductor device
JPS55166975A (en) Manufacture of semiconductor light emitting device
JPS63222489A (ja) 半導体レ−ザの製造方法
JPS57133626A (en) Manufacture of semiconductor thin film
JPS63248168A (ja) ヘテロ接合バイポ−ラトランジスタおよびその製造方法
JPS6474783A (en) Semiconductor light-emitting device
JPS60182132A (ja) 半導体装置の製造方法
JPS5627922A (en) Manufacture of semiconductor device
JPS57122578A (en) Manufacture of schottky junction type semiconductor device
JPS5661179A (en) Preparation of semiconductor radiation detector
JPS6473788A (en) Light emitting semiconductor device
JPS55163874A (en) Manufacture of semiconductor device
JPS5623775A (en) Manufacture of integrated circuit
JPS5585025A (en) Method of fabricating semiconductor wafer
JPS57198618A (en) Manufacture of semiconductor device having multiple crystalline layer
JPS5478683A (en) Manufacture of semiconductor laser
JPS5678120A (en) Manufacture of compound semiconductor device
JPS5635487A (en) Manufacture of semiconductor device
JPS5587446A (en) Manufacture of semiconductor device