JPS5512784A - Location mark for electron beam exposure - Google Patents

Location mark for electron beam exposure

Info

Publication number
JPS5512784A
JPS5512784A JP8622678A JP8622678A JPS5512784A JP S5512784 A JPS5512784 A JP S5512784A JP 8622678 A JP8622678 A JP 8622678A JP 8622678 A JP8622678 A JP 8622678A JP S5512784 A JPS5512784 A JP S5512784A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
location mark
shaped grooves
base plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8622678A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6246976B2 (enrdf_load_stackoverflow
Inventor
Hisaaki Aizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP8622678A priority Critical patent/JPS5512784A/ja
Publication of JPS5512784A publication Critical patent/JPS5512784A/ja
Publication of JPS6246976B2 publication Critical patent/JPS6246976B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP8622678A 1978-07-14 1978-07-14 Location mark for electron beam exposure Granted JPS5512784A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8622678A JPS5512784A (en) 1978-07-14 1978-07-14 Location mark for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8622678A JPS5512784A (en) 1978-07-14 1978-07-14 Location mark for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5512784A true JPS5512784A (en) 1980-01-29
JPS6246976B2 JPS6246976B2 (enrdf_load_stackoverflow) 1987-10-06

Family

ID=13880866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8622678A Granted JPS5512784A (en) 1978-07-14 1978-07-14 Location mark for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5512784A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5870554U (ja) * 1981-11-09 1983-05-13 トヨタ自動車株式会社 ダンパプ−リ
JPS58180022A (ja) * 1982-04-14 1983-10-21 Sanyo Electric Co Ltd 電子ビ−ム露光における位置合せ方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI81458C (fi) * 1987-03-31 1990-10-10 Inter Marketing Oy Anordning foer identifiering av mynt eller dylika.
JPS63188776U (enrdf_load_stackoverflow) * 1987-05-22 1988-12-05
JPH0289574U (enrdf_load_stackoverflow) * 1988-12-23 1990-07-16

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS539475A (en) * 1976-07-12 1978-01-27 Ibm Device for detecting position of electron beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS539475A (en) * 1976-07-12 1978-01-27 Ibm Device for detecting position of electron beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5870554U (ja) * 1981-11-09 1983-05-13 トヨタ自動車株式会社 ダンパプ−リ
JPS58180022A (ja) * 1982-04-14 1983-10-21 Sanyo Electric Co Ltd 電子ビ−ム露光における位置合せ方法

Also Published As

Publication number Publication date
JPS6246976B2 (enrdf_load_stackoverflow) 1987-10-06

Similar Documents

Publication Publication Date Title
JPS5512784A (en) Location mark for electron beam exposure
JPS5323280A (en) Electoron ray exposure device
JPS53127266A (en) Forming method of marker
JPS5363871A (en) Production of semiconductor device
JPS5556334A (en) Manufacturing method of fluorescent layer
JPS5516423A (en) Forming method of thick metal film pattern
JPS5478980A (en) Anisotropic etching method
JPS5330275A (en) Etching method of fine pattern
JPS5421272A (en) Metal photo mask
JPS5534478A (en) Forming pattern
JPS53106576A (en) Ion etching device
JPS5398783A (en) X-ray copying mask
JPS53135582A (en) Semiconductor device and its manufacture
JPS53139476A (en) Manufacture of semiconductor device
JPS5375770A (en) X-ray copying mask
JPS544567A (en) Growing apparatus of ion beam crystal
JPS5349946A (en) Formation of swelled electrode
JPS5380167A (en) Manufacture of semiconductor device
JPS5555528A (en) Mask aligner
JPS5267983A (en) Semiconductor unit
JPS52146209A (en) Formation of epitaxial layer
JPS5511353A (en) Etching method
JPS52119184A (en) Electron beam exposing method
JPS53106575A (en) Production of photoetching mask for production of semiconductor device
JPS5227371A (en) Pattern film formed on upper surface of substrate