JPS55125651A - Production of semiconductor integrated circuit - Google Patents
Production of semiconductor integrated circuitInfo
- Publication number
- JPS55125651A JPS55125651A JP3373479A JP3373479A JPS55125651A JP S55125651 A JPS55125651 A JP S55125651A JP 3373479 A JP3373479 A JP 3373479A JP 3373479 A JP3373479 A JP 3373479A JP S55125651 A JPS55125651 A JP S55125651A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- poly
- layers
- resistance
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 2
- ZXEYZECDXFPJRJ-UHFFFAOYSA-N $l^{3}-silane;platinum Chemical compound [SiH3].[Pt] ZXEYZECDXFPJRJ-UHFFFAOYSA-N 0.000 abstract 1
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 238000001259 photo etching Methods 0.000 abstract 1
- 229910021339 platinum silicide Inorganic materials 0.000 abstract 1
- 229910021332 silicide Inorganic materials 0.000 abstract 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3373479A JPS55125651A (en) | 1979-03-22 | 1979-03-22 | Production of semiconductor integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3373479A JPS55125651A (en) | 1979-03-22 | 1979-03-22 | Production of semiconductor integrated circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55125651A true JPS55125651A (en) | 1980-09-27 |
| JPS6136705B2 JPS6136705B2 (enrdf_load_stackoverflow) | 1986-08-20 |
Family
ID=12394627
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3373479A Granted JPS55125651A (en) | 1979-03-22 | 1979-03-22 | Production of semiconductor integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55125651A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5941870A (ja) * | 1982-08-25 | 1984-03-08 | Toshiba Corp | 半導体装置の製造方法 |
| JPS5978560A (ja) * | 1982-10-26 | 1984-05-07 | Mitsubishi Electric Corp | 半導体集積回路装置の製造方法 |
| JPS59149045A (ja) * | 1983-02-16 | 1984-08-25 | Nec Corp | 半導体装置の製造方法 |
| US4935376A (en) * | 1989-10-12 | 1990-06-19 | At&T Bell Laboratories | Making silicide gate level runners |
| JPH0594963A (ja) * | 1990-08-16 | 1993-04-16 | Internatl Business Mach Corp <Ibm> | 集積回路の種々の厚さの耐火性金属シリサイド層を形成する方法 |
-
1979
- 1979-03-22 JP JP3373479A patent/JPS55125651A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5941870A (ja) * | 1982-08-25 | 1984-03-08 | Toshiba Corp | 半導体装置の製造方法 |
| JPS5978560A (ja) * | 1982-10-26 | 1984-05-07 | Mitsubishi Electric Corp | 半導体集積回路装置の製造方法 |
| JPS59149045A (ja) * | 1983-02-16 | 1984-08-25 | Nec Corp | 半導体装置の製造方法 |
| US4935376A (en) * | 1989-10-12 | 1990-06-19 | At&T Bell Laboratories | Making silicide gate level runners |
| JPH0594963A (ja) * | 1990-08-16 | 1993-04-16 | Internatl Business Mach Corp <Ibm> | 集積回路の種々の厚さの耐火性金属シリサイド層を形成する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6136705B2 (enrdf_load_stackoverflow) | 1986-08-20 |
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