JPS55113324A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS55113324A
JPS55113324A JP1976979A JP1976979A JPS55113324A JP S55113324 A JPS55113324 A JP S55113324A JP 1976979 A JP1976979 A JP 1976979A JP 1976979 A JP1976979 A JP 1976979A JP S55113324 A JPS55113324 A JP S55113324A
Authority
JP
Japan
Prior art keywords
layer
poly
oxide film
substrate
gate oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1976979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS648471B2 (enrdf_load_stackoverflow
Inventor
Jun Murata
Kuniki Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1976979A priority Critical patent/JPS55113324A/ja
Publication of JPS55113324A publication Critical patent/JPS55113324A/ja
Publication of JPS648471B2 publication Critical patent/JPS648471B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP1976979A 1979-02-23 1979-02-23 Manufacture of semiconductor device Granted JPS55113324A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1976979A JPS55113324A (en) 1979-02-23 1979-02-23 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1976979A JPS55113324A (en) 1979-02-23 1979-02-23 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS55113324A true JPS55113324A (en) 1980-09-01
JPS648471B2 JPS648471B2 (enrdf_load_stackoverflow) 1989-02-14

Family

ID=12008532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1976979A Granted JPS55113324A (en) 1979-02-23 1979-02-23 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS55113324A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100451A (ja) * 1981-12-10 1983-06-15 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS61198664A (ja) * 1985-02-27 1986-09-03 Sharp Corp 半導体装置の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915373A (enrdf_load_stackoverflow) * 1972-05-18 1974-02-09

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915373A (enrdf_load_stackoverflow) * 1972-05-18 1974-02-09

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100451A (ja) * 1981-12-10 1983-06-15 Oki Electric Ind Co Ltd 半導体装置の製造方法
JPS61198664A (ja) * 1985-02-27 1986-09-03 Sharp Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS648471B2 (enrdf_load_stackoverflow) 1989-02-14

Similar Documents

Publication Publication Date Title
JPS55113324A (en) Manufacture of semiconductor device
JPS54137982A (en) Semiconductor device and its manufacture
JPS5593251A (en) Manufacture of semiconductor device
JPS5491074A (en) Semiconductor device
JPS5553461A (en) Manufacture of semiconductor device
JPS5556663A (en) Insulating-gate type field-effect transistor
JPS5583267A (en) Method of fabricating semiconductor device
JPS5522879A (en) Insulation gate type field effect semiconductor device
JPS554964A (en) Manufacture of mos type semiconductor
JPS52117079A (en) Preparation of semiconductor device
JPS54121081A (en) Integrated circuit device
JPS5574182A (en) Preparing junction type field effect transistor
JPS54106174A (en) Semiconductor device and its manufacture
JPS55113323A (en) Manufacture of semiconductor device
JPS5327372A (en) Production of s emiconductor device
JPS5591866A (en) Manufacture of semiconductor device
JPS5346287A (en) Production of semiconductor integrated circuit
JPS53101977A (en) Diffusion method of inpurity to semiconductor substrate
JPS5355987A (en) Manufacture of silicon gate mos field effect type semiconductor device
JPS52147983A (en) Insulation gate type semiconductor device
JPS5586161A (en) Manufacture of semiconductor device
JPS5372473A (en) Manufacture of mis type semicondctor device
JPS52147969A (en) Manufacture of semiconductor device
JPS5580333A (en) Manufacture of mos semiconductor device
JPS5489594A (en) Manufacture for integrated circuit