JPS5493974A - Projection-system mask alignment unit - Google Patents

Projection-system mask alignment unit

Info

Publication number
JPS5493974A
JPS5493974A JP24178A JP24178A JPS5493974A JP S5493974 A JPS5493974 A JP S5493974A JP 24178 A JP24178 A JP 24178A JP 24178 A JP24178 A JP 24178A JP S5493974 A JPS5493974 A JP S5493974A
Authority
JP
Japan
Prior art keywords
mask
wafer
projection
pattern
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24178A
Other languages
English (en)
Other versions
JPS6315739B2 (ja
Inventor
Mitsuyoshi Koizumi
Nobuyuki Akiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP24178A priority Critical patent/JPS5493974A/ja
Publication of JPS5493974A publication Critical patent/JPS5493974A/ja
Publication of JPS6315739B2 publication Critical patent/JPS6315739B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP24178A 1978-01-06 1978-01-06 Projection-system mask alignment unit Granted JPS5493974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24178A JPS5493974A (en) 1978-01-06 1978-01-06 Projection-system mask alignment unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24178A JPS5493974A (en) 1978-01-06 1978-01-06 Projection-system mask alignment unit

Publications (2)

Publication Number Publication Date
JPS5493974A true JPS5493974A (en) 1979-07-25
JPS6315739B2 JPS6315739B2 (ja) 1988-04-06

Family

ID=11468462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24178A Granted JPS5493974A (en) 1978-01-06 1978-01-06 Projection-system mask alignment unit

Country Status (1)

Country Link
JP (1) JPS5493974A (ja)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56102823A (en) * 1980-01-19 1981-08-17 Nippon Kogaku Kk <Nikon> Positioning device
JPS56501183A (ja) * 1979-09-24 1981-08-20
JPS57102021A (en) * 1980-11-03 1982-06-24 Zeiss Jena Veb Carl Device for automatically controlling at least one article
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
JPS59119411U (ja) * 1983-01-28 1984-08-11 日本電気ホームエレクトロニクス株式会社 投影露光装置
JPS603620A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 微細パタ−ンの形成方法
JPS6193454A (ja) * 1984-08-28 1986-05-12 エルエスアイ・ロジツク・コ−ポレイシヨン 写真平板式マスク整合装置
JPS63153821A (ja) * 1987-10-27 1988-06-27 Nikon Corp 位置合わせ装置
JPH07261371A (ja) * 1994-03-16 1995-10-13 Nec Corp 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915243U (ja) * 1972-05-18 1974-02-08
JPS4928362A (ja) * 1972-07-05 1974-03-13
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915243U (ja) * 1972-05-18 1974-02-08
JPS4928362A (ja) * 1972-07-05 1974-03-13
JPS52109875A (en) * 1976-02-25 1977-09-14 Hitachi Ltd Position matching system for mask and wafer and its unit

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56501183A (ja) * 1979-09-24 1981-08-20
JPH0353770B2 (ja) * 1980-01-19 1991-08-16
JPS56102823A (en) * 1980-01-19 1981-08-17 Nippon Kogaku Kk <Nikon> Positioning device
JPS57102021A (en) * 1980-11-03 1982-06-24 Zeiss Jena Veb Carl Device for automatically controlling at least one article
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPH0441483B2 (ja) * 1981-02-20 1992-07-08 Nippon Kogaku Kk
JPS5825638A (ja) * 1981-08-08 1983-02-15 Canon Inc 露光装置
JPS59119411U (ja) * 1983-01-28 1984-08-11 日本電気ホームエレクトロニクス株式会社 投影露光装置
JPS603620A (ja) * 1983-06-21 1985-01-10 Mitsubishi Electric Corp 微細パタ−ンの形成方法
JPS6193454A (ja) * 1984-08-28 1986-05-12 エルエスアイ・ロジツク・コ−ポレイシヨン 写真平板式マスク整合装置
JPH0574930B2 (ja) * 1984-08-28 1993-10-19 Lsi Logic Corp
JPH0121615B2 (ja) * 1987-10-27 1989-04-21 Nikon Kk
JPS63153821A (ja) * 1987-10-27 1988-06-27 Nikon Corp 位置合わせ装置
JPH07261371A (ja) * 1994-03-16 1995-10-13 Nec Corp 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法

Also Published As

Publication number Publication date
JPS6315739B2 (ja) 1988-04-06

Similar Documents

Publication Publication Date Title
JPS56110234A (en) Projection printing device
JPS52109875A (en) Position matching system for mask and wafer and its unit
EP0967524A3 (en) Projection exposure method and apparatus
GB1461685A (en) Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask
JPS5493974A (en) Projection-system mask alignment unit
JPS5453867A (en) Printing device
JPS5246813A (en) Photographic optical system for observation for ophthalmofunduscopic c amera
SE8800837L (sv) Anordning for anvendning i ett steg- och repetitionssystem for direkt exponering av halvledarskivor
JPS57181537A (en) Light pattern projector
JPS5743420A (en) Mask alignment method
JPS5347825A (en) Photoresist exposure
KR200151379Y1 (ko) 반도체 스테퍼장비의 조명계
JPS5680043A (en) Far ultraviolet exposing method
JPS5454579A (en) Exposure method
JPS5621328A (en) Method of making pattern
JPS5255867A (en) Exposure method
RU2027207C1 (ru) Устройство для экспонирования линейных шкал
JPS551107A (en) Exposure device
JPS5517153A (en) Centering method of focusing type waveguide lens
JPS5360626A (en) Method for eliminating illumination irregularity
JPS6476720A (en) Illumination optical system for semiconductor exposure device
JPS647619A (en) X-ray aligner
JPS5734555A (en) Formation of mask
JPS5579430A (en) Lighting equipment
JPS5657037A (en) Projection exposing method