JPS6476720A - Illumination optical system for semiconductor exposure device - Google Patents

Illumination optical system for semiconductor exposure device

Info

Publication number
JPS6476720A
JPS6476720A JP62233493A JP23349387A JPS6476720A JP S6476720 A JPS6476720 A JP S6476720A JP 62233493 A JP62233493 A JP 62233493A JP 23349387 A JP23349387 A JP 23349387A JP S6476720 A JPS6476720 A JP S6476720A
Authority
JP
Japan
Prior art keywords
integrator
illumination
reticle
optical axis
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62233493A
Other languages
Japanese (ja)
Other versions
JPH07105330B2 (en
Inventor
Yoichi Iba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP62233493A priority Critical patent/JPH07105330B2/en
Publication of JPS6476720A publication Critical patent/JPS6476720A/en
Publication of JPH07105330B2 publication Critical patent/JPH07105330B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To uniformize the illuminance of the whole surface of a reticle and to maintain the NA of an illumination light to the reticle constant irrespective of its azimuth by disposing an image rotator between a light source and an integrator in an illumination optical system for a semiconductor exposure device, and rotating the rotator at an optical axis a center during exposure. CONSTITUTION:A luminous flux irradiated from an excimer laser light source 1 is incident to an image rotator 8 rotated at an optical axis as a center, and rotated. After the flux is enlarged by a beam expander 2, it is irradiated to the edge face of an integrator 3. Accordingly, even if the section of the flux radiated from the source 1 has any illumination distribution, if the time average is taken at the face of the integrator 3, an illumination having symmetrical characteristic with respect to the optical axis is performed. On the other hand, if the illumination distribution of the incident edge face of the integrator 3 is axially symmetrical, the intensity distributions of a plurality of light source images formed near the radiating edge face of the integrator 3 become axially symmetrical. Accordingly, the illumination distribution of the entrance pupil of a projection lens becomes axially symmetrical, and the NA of the illumination light to a reticle 5 becomes constant irrespective of its azimuth.
JP62233493A 1987-09-17 1987-09-17 Illumination optical system for semiconductor exposure equipment Expired - Fee Related JPH07105330B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62233493A JPH07105330B2 (en) 1987-09-17 1987-09-17 Illumination optical system for semiconductor exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62233493A JPH07105330B2 (en) 1987-09-17 1987-09-17 Illumination optical system for semiconductor exposure equipment

Publications (2)

Publication Number Publication Date
JPS6476720A true JPS6476720A (en) 1989-03-22
JPH07105330B2 JPH07105330B2 (en) 1995-11-13

Family

ID=16955880

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62233493A Expired - Fee Related JPH07105330B2 (en) 1987-09-17 1987-09-17 Illumination optical system for semiconductor exposure equipment

Country Status (1)

Country Link
JP (1) JPH07105330B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5763853A (en) * 1994-04-20 1998-06-09 Hitachi Construction Machinery Co., Ltd. Laser processing apparatus, laser processing method and dam bar processing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332555A (en) * 1986-07-25 1988-02-12 Nippon Telegr & Teleph Corp <Ntt> Exposing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332555A (en) * 1986-07-25 1988-02-12 Nippon Telegr & Teleph Corp <Ntt> Exposing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5763853A (en) * 1994-04-20 1998-06-09 Hitachi Construction Machinery Co., Ltd. Laser processing apparatus, laser processing method and dam bar processing method

Also Published As

Publication number Publication date
JPH07105330B2 (en) 1995-11-13

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees