JPS62260118A - Projection exposure device - Google Patents
Projection exposure deviceInfo
- Publication number
- JPS62260118A JPS62260118A JP61102637A JP10263786A JPS62260118A JP S62260118 A JPS62260118 A JP S62260118A JP 61102637 A JP61102637 A JP 61102637A JP 10263786 A JP10263786 A JP 10263786A JP S62260118 A JPS62260118 A JP S62260118A
- Authority
- JP
- Japan
- Prior art keywords
- projection lens
- secondary light
- light source
- integrator
- space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 8
- 238000005286 illumination Methods 0.000 claims description 4
- 230000006378 damage Effects 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 4
- 241000276498 Pollachius virens Species 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野１
本発明は、リソグラフィー等の投影露光を行なう投影露
光装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field 1] The present invention relates to a projection exposure apparatus that performs projection exposure such as lithography.
［従来の技術］
従来、この種の装置は、第３図に示すようなものがある
。[Prior Art] Conventionally, there is a device of this type as shown in FIG.
図において光源１０から供給されるコヒーレント光によ
ってインテグレータ１１は、二次光源１２を形成する。In the figure, an integrator 11 forms a secondary light source 12 using coherent light supplied from a light source 10.
これら二次光源は、実質的にインコヒーレントな面光源
を形成づるものであり、二次光源１２からは二次光源の
共役関係を示で複数の光線（図中、二点破線で示１゜）
が発生し、これら光線は、コンデンサレンズ１３および
投影レンズ群１４によって集光され、投影レンズ群１４
内の任意の位置に二次光源の像１５を結像させている。These secondary light sources form a substantially incoherent surface light source, and from the secondary light source 12, a plurality of light rays (indicated by two dotted lines in the figure) )
is generated, and these light rays are condensed by the condenser lens 13 and the projection lens group 14.
An image 15 of the secondary light source is formed at an arbitrary position within.
このような投影露光装置としては、一般に、第３図に示
したように、二次光源１２の像をコンデンサレン１１３
客によって投影レンズ１４ｅの入射ひとみ上に結像させ
る、いわゆるケーラー照明がなされるものがある。とこ
ろで上記投影露光装置は、光源にビークパワーの低い光
源１０を用いているので、投影レンズ１４ｅに二次′光
源が結像されても、上記投影レンズには集光による異常
が発生することはない。したがってレチクル１６とウェ
ハ１７との共役関係を示す光線（図中、実線で承り。）
は、レチクル１６上に形成されているパターンを投影レ
ンズ群１４を介してウェハ１７上に投影さぜることがで
きる。Generally, in such a projection exposure apparatus, as shown in FIG.
Some customers use so-called Koehler illumination, in which an image is formed on the entrance pupil of the projection lens 14e. By the way, since the projection exposure apparatus uses the light source 10 with low beak power as the light source, even if the secondary light source is imaged on the projection lens 14e, no abnormality will occur in the projection lens due to light condensation. do not have. Therefore, the light beam showing the conjugate relationship between the reticle 16 and the wafer 17 (indicated by the solid line in the figure)
The pattern formed on the reticle 16 can be projected onto the wafer 17 via the projection lens group 14.
［発明が解決しようとする問題点１
ところが光源にインコヒーレントなレーザ光を発振させ
る、例えばエキシマレーザを使用してパターンの露光を
行なう投影露光装置の場合は、エキシマレーザがパルス
発振であるためビークパワーがその他の光源に比べて、
パルス当り２００［ＩＩＪ／ ｃｍ ］と非常に高く、
光が集光する地点ではきわめて高いパワーになる。よっ
て複数の二次光源から発生する光が投影レンズに集光さ
れると、投影レンズは溶けて破壊されてしまうという問
題点があった。[Problem to be Solved by the Invention 1] However, in the case of a projection exposure apparatus that exposes a pattern using an excimer laser, in which the light source oscillates incoherent laser light, for example, the excimer laser emits a pulsed laser beam, so the peak power compared to other light sources,
It is extremely high at 200 [IIJ/cm ] per pulse.
At the point where the light is focused, it becomes extremely powerful. Therefore, when the light generated from the plurality of secondary light sources is focused on the projection lens, there is a problem that the projection lens is melted and destroyed.
本発明は、上記問題点に鑑みなされたもので、１キシマ
レーザ光による投影レンズの破壊を防止することができ
る投影露光装置を提供することを目的とでる。The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a projection exposure apparatus that can prevent a projection lens from being destroyed by 1 ximer laser light.
［問題点を解決するための手段］
本発明は、投影光学系に空隙を設け、二次光源の像を前
記空隙に結像させることを特徴とする。[Means for Solving the Problems] The present invention is characterized in that a projection optical system is provided with a gap, and an image of a secondary light source is formed in the gap.
［作用］
したがって、照明光学系によって形成される複数の二次
光源の光は、投影光学系内の投影レンズ以外の空隙に集
光し、投影レンズの破壊を防ぐことができる。[Function] Therefore, the light from the plurality of secondary light sources formed by the illumination optical system is focused on the gap other than the projection lens in the projection optical system, and the destruction of the projection lens can be prevented.
［実施例１
第１図は、本発明の一実施例を示ず構成図【、第３図と
同様の機能を承り部分については説明の都合上同一符号
を符でる。本発明では、第１図に示すように、投影レン
ズ群１４内に空隙２３を設け、インテグレータ１１によ
って形成される二次光源の像を空隙２３に結像するよう
にインテグレータ１１、コンデンサ１３および投影レン
ズ群１４内の各投影レンズの位置調節を行なう。この位
置調節によって、エキシマレーザ２０から発振したレー
ザ光は、２枚のシリンドリカルレンズ２１．２２でコリ
メートされ、所定のビーム形状の平行光となってインデ
グレータ１１に入射される。インテグレータ１１は、上
記平行光の入射によって複数の二次光源１２を形成させ
、二次光源１２から発生した光線（図中、二点破線で示
す）は、調節されたコンデンサレンズ１３および投影レ
ンズ群１４のレチクル１６側の５枚のレンズ１４ａ〜１
４０によって集光され、二次光源の像１５を投影レンズ
Ｉ！￥ １４内に設けた空隙２３に結像させることがで
きる。Embodiment 1 FIG. 1 is a block diagram, not showing an embodiment of the present invention; parts having the same functions as those in FIG. 3 are designated by the same reference numerals for convenience of explanation. In the present invention, as shown in FIG. 1, a gap 23 is provided in the projection lens group 14, and the integrator 11, the condenser 13 and the projection The position of each projection lens in the lens group 14 is adjusted. By this position adjustment, the laser light oscillated from the excimer laser 20 is collimated by the two cylindrical lenses 21 and 22, and is made into parallel light having a predetermined beam shape and is incident on the indegrator 11. The integrator 11 forms a plurality of secondary light sources 12 by the incidence of the parallel light, and the light rays generated from the secondary light sources 12 (indicated by two dotted lines in the figure) are transmitted to the adjusted condenser lens 13 and the projection lens group. 14 reticle 16 side five lenses 14a to 1
40 and projects the image 15 of the secondary light source onto the lens I! The image can be formed in the gap 23 provided within the space 14.
ところでインテグレータ１１は、第２図に示すような構
造のものであり、ＫｒＦで２４８．４ ｎｍの紫外光よ
りなるエキシマレーザ光に対して透過率の高い石英のみ
によって構成されており、表面と裏面の曲率は焦点が一
致するように設計されている。したがってインデグレー
タ１１は、エキシマレーザ光が入射すると、インコヒー
レントな面光源（二次光源）を形成することができる。Incidentally, the integrator 11 has a structure as shown in FIG. 2, and is made only of quartz, which is KrF and has a high transmittance to excimer laser light consisting of 248.4 nm ultraviolet light. The curvature of is designed to match the focus. Therefore, when the excimer laser light is incident on the indegrator 11, it is possible to form an incoherent surface light source (secondary light source).
これによりレチクル１６上での照明エリアは、強度分布
が均一で干渉しまの生じないレチクル１６とほぼ同形状
の正方形となり、該正方形の光線（図中、実線で示す。As a result, the illumination area on the reticle 16 becomes a square approximately the same shape as the reticle 16 with a uniform intensity distribution and no interference stripes, and the light rays of the square (indicated by solid lines in the figure).
）によりレチクル１６上に形成されたパターンは、投影
レンズ群１４を介してウェハ１７上に投影される。) is projected onto the wafer 17 via the projection lens group 14.
［発明の効果］
以上説明したように、本発明は投影光学系に空隙を設け
、二次光源の像を前記空隙に結株させるようにしたので
、インテグレータによる二次光源の光は投影レンズ以外
の空隙に集光し、投影レンズの破壊を防ぐことができる
。[Effects of the Invention] As explained above, in the present invention, a gap is provided in the projection optical system, and the image of the secondary light source is focused in the gap, so that the light from the secondary light source by the integrator is transmitted to sources other than the projection lens. This allows the light to be focused on the gap in the projection lens, preventing damage to the projection lens.
第１図は本発明の一実施例を示す構成図、第２図は本発
明のインテグレータを示す図、第３図は従来の投影露光
装置の構成図である。
１１・・・インテグレータ、１２・・・二次光源、１３
・・・コンデンサレンズ、１４・・・投影レンズ群、１
４ａ〜１４ｅ・・・投影レンズ、１５・・・二次光源の
像、１６・・・レチクル、１７・・・ウェハ、２０・・
・工４−シマレーザ、２３・・・空隙。FIG. 1 is a block diagram showing an embodiment of the present invention, FIG. 2 is a block diagram showing an integrator of the present invention, and FIG. 3 is a block diagram of a conventional projection exposure apparatus. 11... Integrator, 12... Secondary light source, 13
... Condenser lens, 14 ... Projection lens group, 1
4a to 14e... Projection lens, 15... Image of secondary light source, 16... Reticle, 17... Wafer, 20...
・Work 4-Shimmer laser, 23... air gap.
Claims (1)
投影露光装置において、 光源から供給されるレーザ光をコリメートするコリメー
ト光学系と、 前記コリメートされたレーザ光により二次光源を形成す
る照明光学系と、 空隙を有し、前記二次光源から供給される光の集光によ
る該二次光源の像を前記空隙に結像させる投影光学系と を具えたことを特徴とする投影露光装置。[Claims] A projection exposure apparatus having a light source that oscillates incoherent laser light, comprising: a collimating optical system that collimates the laser light supplied from the light source; and a secondary light source formed by the collimated laser light. A projection exposure system comprising: an illumination optical system; and a projection optical system having a gap and condensing light supplied from the secondary light source to form an image of the secondary light source on the gap. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61102637A JPS62260118A (en) | 1986-05-02 | 1986-05-02 | Projection exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61102637A JPS62260118A (en) | 1986-05-02 | 1986-05-02 | Projection exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62260118A true JPS62260118A (en) | 1987-11-12 |
Family
ID=14332755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61102637A Pending JPS62260118A (en) | 1986-05-02 | 1986-05-02 | Projection exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62260118A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0232317A (en) * | 1988-07-21 | 1990-02-02 | Kanagawa Pref Gov | Optical system for excimer laser beam |
| US6661499B2 (en) | 1998-06-12 | 2003-12-09 | Nikon Corporation | Projection exposure apparatus with a catadioptric projection optical system |
-
1986
- 1986-05-02 JP JP61102637A patent/JPS62260118A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0232317A (en) * | 1988-07-21 | 1990-02-02 | Kanagawa Pref Gov | Optical system for excimer laser beam |
| US6661499B2 (en) | 1998-06-12 | 2003-12-09 | Nikon Corporation | Projection exposure apparatus with a catadioptric projection optical system |
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