JPS5489579A - Electron ray exposure system - Google Patents
Electron ray exposure systemInfo
- Publication number
- JPS5489579A JPS5489579A JP15991977A JP15991977A JPS5489579A JP S5489579 A JPS5489579 A JP S5489579A JP 15991977 A JP15991977 A JP 15991977A JP 15991977 A JP15991977 A JP 15991977A JP S5489579 A JPS5489579 A JP S5489579A
- Authority
- JP
- Japan
- Prior art keywords
- region
- electron beam
- diameter
- pattern
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15991977A JPS5489579A (en) | 1977-12-27 | 1977-12-27 | Electron ray exposure system |
US05/971,043 US4199689A (en) | 1977-12-21 | 1978-12-19 | Electron beam exposing method and electron beam apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15991977A JPS5489579A (en) | 1977-12-27 | 1977-12-27 | Electron ray exposure system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5489579A true JPS5489579A (en) | 1979-07-16 |
Family
ID=15704012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15991977A Pending JPS5489579A (en) | 1977-12-21 | 1977-12-27 | Electron ray exposure system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5489579A (ja) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133825A (en) * | 1980-03-21 | 1981-10-20 | Toshiba Corp | Electron beam device |
JPS58135641A (ja) * | 1982-02-06 | 1983-08-12 | Jeol Ltd | 電子ビ−ム露光方法 |
JPS60244025A (ja) * | 1984-05-18 | 1985-12-03 | Hitachi Ltd | 電子線描画装置 |
JPS60261134A (ja) * | 1984-06-07 | 1985-12-24 | Jeol Ltd | 電子線描画装置 |
JPS61125127A (ja) * | 1984-11-22 | 1986-06-12 | Toshiba Mach Co Ltd | 電子ビ−ム露光装置 |
JPS6254428A (ja) * | 1985-09-03 | 1987-03-10 | Toshiba Corp | 電子ビ−ム露光方法 |
JPS6293933A (ja) * | 1985-10-21 | 1987-04-30 | Fujitsu Ltd | 電子ビ−ム露光方法 |
JPS62122214A (ja) * | 1985-11-22 | 1987-06-03 | Toshiba Mach Co Ltd | 電子ビーム描画装置 |
JP2005057275A (ja) * | 2003-08-01 | 2005-03-03 | Leica Microsystems Lithography Ltd | パターン書き込み装置 |
KR20160111866A (ko) * | 2015-03-17 | 2016-09-27 | 아이엠에스 나노패브릭케이션 아게 | 완화된 임계 치수의 패턴 에어리어의 멀티빔 기록 |
-
1977
- 1977-12-27 JP JP15991977A patent/JPS5489579A/ja active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133825A (en) * | 1980-03-21 | 1981-10-20 | Toshiba Corp | Electron beam device |
JPH0450732B2 (ja) * | 1980-03-21 | 1992-08-17 | Tokyo Shibaura Electric Co | |
JPS58135641A (ja) * | 1982-02-06 | 1983-08-12 | Jeol Ltd | 電子ビ−ム露光方法 |
JPS60244025A (ja) * | 1984-05-18 | 1985-12-03 | Hitachi Ltd | 電子線描画装置 |
JPS60261134A (ja) * | 1984-06-07 | 1985-12-24 | Jeol Ltd | 電子線描画装置 |
JPS61125127A (ja) * | 1984-11-22 | 1986-06-12 | Toshiba Mach Co Ltd | 電子ビ−ム露光装置 |
JPS6254428A (ja) * | 1985-09-03 | 1987-03-10 | Toshiba Corp | 電子ビ−ム露光方法 |
JPS6293933A (ja) * | 1985-10-21 | 1987-04-30 | Fujitsu Ltd | 電子ビ−ム露光方法 |
JPS62122214A (ja) * | 1985-11-22 | 1987-06-03 | Toshiba Mach Co Ltd | 電子ビーム描画装置 |
JP2005057275A (ja) * | 2003-08-01 | 2005-03-03 | Leica Microsystems Lithography Ltd | パターン書き込み装置 |
KR20160111866A (ko) * | 2015-03-17 | 2016-09-27 | 아이엠에스 나노패브릭케이션 아게 | 완화된 임계 치수의 패턴 에어리어의 멀티빔 기록 |
JP2016174152A (ja) * | 2015-03-17 | 2016-09-29 | アイエムエス ナノファブリケーション アーゲー | 限界寸法が緩和されたパターンエリアのマルチビーム描画 |
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