JPS5443480A - Mask aligner - Google Patents
Mask alignerInfo
- Publication number
- JPS5443480A JPS5443480A JP10884677A JP10884677A JPS5443480A JP S5443480 A JPS5443480 A JP S5443480A JP 10884677 A JP10884677 A JP 10884677A JP 10884677 A JP10884677 A JP 10884677A JP S5443480 A JPS5443480 A JP S5443480A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- air
- hole
- chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a mask aligner featuring the isolating mechanism of a high reproducibility by jetting the air between the mask holder and the wafer chuck mechanism.
CONSTITUTION: Holder 5 to which mask 8 is adsorbed is fixed on support 4, and wafer 9 coated with resist is fixed on wafer chuck mechanism 10. The air is jetted through hole 15 to push up collar 11, and chuck 10 is raised up to secure adhesion between the wafer and the mask. At the same time, the air is jetted to collar 11 through hole 17 to keep the slit about 20 m. The floated chuck 10 is controlled via screw 13 while being observed through microscope 19 to match the mask with the wafer, and then the mask is adhered to the wafer with stoppage of jetting through hole 17. Thus, the gap between the wafer and the mask is adjusted by the air pressure in an accurate way with a high reproducubility, ensuring a simple constitution as well as easy maintenance and control.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10884677A JPS5443480A (en) | 1977-09-12 | 1977-09-12 | Mask aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10884677A JPS5443480A (en) | 1977-09-12 | 1977-09-12 | Mask aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5443480A true JPS5443480A (en) | 1979-04-06 |
Family
ID=14495057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10884677A Pending JPS5443480A (en) | 1977-09-12 | 1977-09-12 | Mask aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5443480A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56164549U (en) * | 1980-05-08 | 1981-12-07 | ||
JPS5712743U (en) * | 1980-06-23 | 1982-01-22 | ||
JPS6332949A (en) * | 1986-07-24 | 1988-02-12 | Yokogawa Hewlett Packard Ltd | Hot chucking device |
JPH03272127A (en) * | 1990-03-22 | 1991-12-03 | Hitachi Electron Eng Co Ltd | Substrate exposure device |
EP0714849A1 (en) | 1994-11-28 | 1996-06-05 | Mitsui Toatsu Chemicals, Incorporated | Production process for refined hydrogen iodide |
JP2014137559A (en) * | 2013-01-18 | 2014-07-28 | Ulvac Japan Ltd | Posture controller |
-
1977
- 1977-09-12 JP JP10884677A patent/JPS5443480A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56164549U (en) * | 1980-05-08 | 1981-12-07 | ||
JPS6144427Y2 (en) * | 1980-05-08 | 1986-12-15 | ||
JPS5712743U (en) * | 1980-06-23 | 1982-01-22 | ||
JPS6218033Y2 (en) * | 1980-06-23 | 1987-05-09 | ||
JPS6332949A (en) * | 1986-07-24 | 1988-02-12 | Yokogawa Hewlett Packard Ltd | Hot chucking device |
JPH03272127A (en) * | 1990-03-22 | 1991-12-03 | Hitachi Electron Eng Co Ltd | Substrate exposure device |
EP0714849A1 (en) | 1994-11-28 | 1996-06-05 | Mitsui Toatsu Chemicals, Incorporated | Production process for refined hydrogen iodide |
US5693306A (en) * | 1994-11-28 | 1997-12-02 | Mitsui Toatsu Chemicals, Inc. | Production process for refined hydrogen iodide |
JP2014137559A (en) * | 2013-01-18 | 2014-07-28 | Ulvac Japan Ltd | Posture controller |
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