JPS5443480A - Mask aligner - Google Patents

Mask aligner

Info

Publication number
JPS5443480A
JPS5443480A JP10884677A JP10884677A JPS5443480A JP S5443480 A JPS5443480 A JP S5443480A JP 10884677 A JP10884677 A JP 10884677A JP 10884677 A JP10884677 A JP 10884677A JP S5443480 A JPS5443480 A JP S5443480A
Authority
JP
Japan
Prior art keywords
mask
wafer
air
hole
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10884677A
Other languages
Japanese (ja)
Inventor
Kiyoshi Yoshida
Atsushi Fujisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10884677A priority Critical patent/JPS5443480A/en
Publication of JPS5443480A publication Critical patent/JPS5443480A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a mask aligner featuring the isolating mechanism of a high reproducibility by jetting the air between the mask holder and the wafer chuck mechanism.
CONSTITUTION: Holder 5 to which mask 8 is adsorbed is fixed on support 4, and wafer 9 coated with resist is fixed on wafer chuck mechanism 10. The air is jetted through hole 15 to push up collar 11, and chuck 10 is raised up to secure adhesion between the wafer and the mask. At the same time, the air is jetted to collar 11 through hole 17 to keep the slit about 20 m. The floated chuck 10 is controlled via screw 13 while being observed through microscope 19 to match the mask with the wafer, and then the mask is adhered to the wafer with stoppage of jetting through hole 17. Thus, the gap between the wafer and the mask is adjusted by the air pressure in an accurate way with a high reproducubility, ensuring a simple constitution as well as easy maintenance and control.
COPYRIGHT: (C)1979,JPO&Japio
JP10884677A 1977-09-12 1977-09-12 Mask aligner Pending JPS5443480A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10884677A JPS5443480A (en) 1977-09-12 1977-09-12 Mask aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10884677A JPS5443480A (en) 1977-09-12 1977-09-12 Mask aligner

Publications (1)

Publication Number Publication Date
JPS5443480A true JPS5443480A (en) 1979-04-06

Family

ID=14495057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10884677A Pending JPS5443480A (en) 1977-09-12 1977-09-12 Mask aligner

Country Status (1)

Country Link
JP (1) JPS5443480A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56164549U (en) * 1980-05-08 1981-12-07
JPS5712743U (en) * 1980-06-23 1982-01-22
JPS6332949A (en) * 1986-07-24 1988-02-12 Yokogawa Hewlett Packard Ltd Hot chucking device
JPH03272127A (en) * 1990-03-22 1991-12-03 Hitachi Electron Eng Co Ltd Substrate exposure device
EP0714849A1 (en) 1994-11-28 1996-06-05 Mitsui Toatsu Chemicals, Incorporated Production process for refined hydrogen iodide
JP2014137559A (en) * 2013-01-18 2014-07-28 Ulvac Japan Ltd Posture controller

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56164549U (en) * 1980-05-08 1981-12-07
JPS6144427Y2 (en) * 1980-05-08 1986-12-15
JPS5712743U (en) * 1980-06-23 1982-01-22
JPS6218033Y2 (en) * 1980-06-23 1987-05-09
JPS6332949A (en) * 1986-07-24 1988-02-12 Yokogawa Hewlett Packard Ltd Hot chucking device
JPH03272127A (en) * 1990-03-22 1991-12-03 Hitachi Electron Eng Co Ltd Substrate exposure device
EP0714849A1 (en) 1994-11-28 1996-06-05 Mitsui Toatsu Chemicals, Incorporated Production process for refined hydrogen iodide
US5693306A (en) * 1994-11-28 1997-12-02 Mitsui Toatsu Chemicals, Inc. Production process for refined hydrogen iodide
JP2014137559A (en) * 2013-01-18 2014-07-28 Ulvac Japan Ltd Posture controller

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