JPS5771666A - Apparatus for coating resist - Google Patents
Apparatus for coating resistInfo
- Publication number
- JPS5771666A JPS5771666A JP14650580A JP14650580A JPS5771666A JP S5771666 A JPS5771666 A JP S5771666A JP 14650580 A JP14650580 A JP 14650580A JP 14650580 A JP14650580 A JP 14650580A JP S5771666 A JPS5771666 A JP S5771666A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- resist
- gas
- plate
- substrate plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To form a uniform film free from an adhered substance by injecting a gas from an upper part above a substrare plate which has to be coated with a resist to such a direction that said gas is not directly hit to a resist coated subtrate plate.
CONSTITUTION: A wafer substrate plate 11 is set on a wafer chuck 10 and, after a resist material is dropped on the wafer substrate plate 11, said wafer substrate plate 11 is rotated along with the wafer chuck to from a uniform resist film. During a time when the wafer is rotated, an N2 gas or air is flowed from a gas injecting port 12 above the wafer and said gas is adjusted so as not to be directly hit to a surface of the wafer. That is, because a stream of said gas toward a side direction or a lower direction of the wafer from an upper part above the wafer substrate plate 11 is formed, the mist like resist generated during resist coating is not blown up onto the wafer substrare plate 11 and exhausted to a side direction or a lower direction and is not readhered on a resist film.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14650580A JPS5771666A (en) | 1980-10-20 | 1980-10-20 | Apparatus for coating resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14650580A JPS5771666A (en) | 1980-10-20 | 1980-10-20 | Apparatus for coating resist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5771666A true JPS5771666A (en) | 1982-05-04 |
Family
ID=15409141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14650580A Pending JPS5771666A (en) | 1980-10-20 | 1980-10-20 | Apparatus for coating resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5771666A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63188940U (en) * | 1987-05-28 | 1988-12-05 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5337582U (en) * | 1976-09-06 | 1978-04-01 | ||
JPS55165170A (en) * | 1979-06-07 | 1980-12-23 | Mitsubishi Electric Corp | Application apparatus of resist agent |
-
1980
- 1980-10-20 JP JP14650580A patent/JPS5771666A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5337582U (en) * | 1976-09-06 | 1978-04-01 | ||
JPS55165170A (en) * | 1979-06-07 | 1980-12-23 | Mitsubishi Electric Corp | Application apparatus of resist agent |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63188940U (en) * | 1987-05-28 | 1988-12-05 | ||
JPH0521864Y2 (en) * | 1987-05-28 | 1993-06-04 |
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