JPS544063A - Low pressure deposition method for impurity - Google Patents
Low pressure deposition method for impurityInfo
- Publication number
- JPS544063A JPS544063A JP6890877A JP6890877A JPS544063A JP S544063 A JPS544063 A JP S544063A JP 6890877 A JP6890877 A JP 6890877A JP 6890877 A JP6890877 A JP 6890877A JP S544063 A JPS544063 A JP S544063A
- Authority
- JP
- Japan
- Prior art keywords
- impurity
- deposition method
- low pressure
- pressure deposition
- dispersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Bipolar Transistors (AREA)
Abstract
PURPOSE: To reduce the dispersion in the specific resistance of diffusion layer, by performing deposition at a low temperature at first and performing it at normal temperature after forming a given film thickness, in impurity deposition method.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6890877A JPS544063A (en) | 1977-06-13 | 1977-06-13 | Low pressure deposition method for impurity |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6890877A JPS544063A (en) | 1977-06-13 | 1977-06-13 | Low pressure deposition method for impurity |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS544063A true JPS544063A (en) | 1979-01-12 |
Family
ID=13387212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6890877A Pending JPS544063A (en) | 1977-06-13 | 1977-06-13 | Low pressure deposition method for impurity |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS544063A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112466985A (en) * | 2020-10-30 | 2021-03-09 | 江苏润阳悦达光伏科技有限公司 | Low-pressure diffusion process for improving uniformity of diffusion sheet resistance single chip |
-
1977
- 1977-06-13 JP JP6890877A patent/JPS544063A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112466985A (en) * | 2020-10-30 | 2021-03-09 | 江苏润阳悦达光伏科技有限公司 | Low-pressure diffusion process for improving uniformity of diffusion sheet resistance single chip |
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