JPS54154272A - Contact forming method for semiconductor device - Google Patents

Contact forming method for semiconductor device

Info

Publication number
JPS54154272A
JPS54154272A JP6359678A JP6359678A JPS54154272A JP S54154272 A JPS54154272 A JP S54154272A JP 6359678 A JP6359678 A JP 6359678A JP 6359678 A JP6359678 A JP 6359678A JP S54154272 A JPS54154272 A JP S54154272A
Authority
JP
Japan
Prior art keywords
film
poly
crystal
aperture
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6359678A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6133253B2 (en, 2012
Inventor
Atsushi Ueno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6359678A priority Critical patent/JPS54154272A/ja
Publication of JPS54154272A publication Critical patent/JPS54154272A/ja
Publication of JPS6133253B2 publication Critical patent/JPS6133253B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP6359678A 1978-05-26 1978-05-26 Contact forming method for semiconductor device Granted JPS54154272A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6359678A JPS54154272A (en) 1978-05-26 1978-05-26 Contact forming method for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6359678A JPS54154272A (en) 1978-05-26 1978-05-26 Contact forming method for semiconductor device

Publications (2)

Publication Number Publication Date
JPS54154272A true JPS54154272A (en) 1979-12-05
JPS6133253B2 JPS6133253B2 (en, 2012) 1986-08-01

Family

ID=13233800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6359678A Granted JPS54154272A (en) 1978-05-26 1978-05-26 Contact forming method for semiconductor device

Country Status (1)

Country Link
JP (1) JPS54154272A (en, 2012)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5780767A (en) * 1980-11-07 1982-05-20 Fujitsu Ltd Semiconductor device and manufacture thereof
JPS5788724A (en) * 1980-11-21 1982-06-02 Fujitsu Ltd Manufacture of semiconductor device
JPS57106067A (en) * 1980-12-23 1982-07-01 Toshiba Corp Manufacture of semiconductor device
JPS5852872A (ja) * 1981-09-24 1983-03-29 Nec Corp 半導体集積回路装置
JPS59135724A (ja) * 1983-01-24 1984-08-04 Seiko Epson Corp 半導体装置の製造方法
JPS6089921A (ja) * 1983-10-24 1985-05-20 Rohm Co Ltd 半導体装置の製造方法
JPS62139321A (ja) * 1985-12-12 1987-06-23 Fujitsu Ltd 半導体装置の製造方法
JPS62268130A (ja) * 1986-05-15 1987-11-20 Toshiba Corp 半導体装置の製造方法
JPS63112357A (ja) * 1986-10-25 1988-05-17 Akitomo Yano ピンチロ−ル

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5780767A (en) * 1980-11-07 1982-05-20 Fujitsu Ltd Semiconductor device and manufacture thereof
JPS5788724A (en) * 1980-11-21 1982-06-02 Fujitsu Ltd Manufacture of semiconductor device
JPS57106067A (en) * 1980-12-23 1982-07-01 Toshiba Corp Manufacture of semiconductor device
JPS5852872A (ja) * 1981-09-24 1983-03-29 Nec Corp 半導体集積回路装置
JPS59135724A (ja) * 1983-01-24 1984-08-04 Seiko Epson Corp 半導体装置の製造方法
JPS6089921A (ja) * 1983-10-24 1985-05-20 Rohm Co Ltd 半導体装置の製造方法
JPS62139321A (ja) * 1985-12-12 1987-06-23 Fujitsu Ltd 半導体装置の製造方法
JPS62268130A (ja) * 1986-05-15 1987-11-20 Toshiba Corp 半導体装置の製造方法
JPS63112357A (ja) * 1986-10-25 1988-05-17 Akitomo Yano ピンチロ−ル

Also Published As

Publication number Publication date
JPS6133253B2 (en, 2012) 1986-08-01

Similar Documents

Publication Publication Date Title
JPS54154272A (en) Contact forming method for semiconductor device
JPS54130883A (en) Production of semiconductor device
JPS6430245A (en) Manufacture of semiconductor device
JPS52124860A (en) Electrode formation method for semiconductor devices
JPS5513904A (en) Semiconductor device and its manufacturing method
JPS5591138A (en) Die forming of semiconductor device
JPS5515230A (en) Semiconductor device and its manufacturing method
JPS5541738A (en) Preparation of semiconductor device
JPS5750451A (en) Semiconductor
JPS5735368A (en) Manufacture of semiconductor device
JPS53137685A (en) Manufacture for semiconductor device
JPS6430270A (en) Manufacture of insulated-gate semiconductor device
JPS57196543A (en) Manufacture of semiconductor device
JPS6441219A (en) Manufacture of semiconductor device
JPS57173956A (en) Manufacture of semiconductor device
JPS55102269A (en) Method of fabricating semiconductor device
JPS54158889A (en) Manufacture of semiconductor device
JPS5748270A (en) Semiconductor device
JPS57184231A (en) Manufacture of semiconductor device
JPS5287359A (en) Production of semiconductor device
JPS54139486A (en) Manufacture of semiconductor device
JPS5555548A (en) Method of fabricating semiconductor device
JPS5244165A (en) Process for production of semiconductor device
JPS54129881A (en) Manufacture for semiconductor device
JPS56158443A (en) Manufacture of semiconductor device