JPS54109775A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS54109775A JPS54109775A JP1729978A JP1729978A JPS54109775A JP S54109775 A JPS54109775 A JP S54109775A JP 1729978 A JP1729978 A JP 1729978A JP 1729978 A JP1729978 A JP 1729978A JP S54109775 A JPS54109775 A JP S54109775A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- film
- resist pattern
- heat treatment
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000010438 heat treatment Methods 0.000 abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1729978A JPS54109775A (en) | 1978-02-16 | 1978-02-16 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1729978A JPS54109775A (en) | 1978-02-16 | 1978-02-16 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54109775A true JPS54109775A (en) | 1979-08-28 |
JPS6217373B2 JPS6217373B2 (enrdf_load_stackoverflow) | 1987-04-17 |
Family
ID=11940116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1729978A Granted JPS54109775A (en) | 1978-02-16 | 1978-02-16 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54109775A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60140735A (ja) * | 1983-12-28 | 1985-07-25 | Fujitsu Ltd | 半導体装置の製造方法 |
US6177337B1 (en) | 1998-01-06 | 2001-01-23 | International Business Machines Corporation | Method of reducing metal voids in semiconductor device interconnection |
-
1978
- 1978-02-16 JP JP1729978A patent/JPS54109775A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60140735A (ja) * | 1983-12-28 | 1985-07-25 | Fujitsu Ltd | 半導体装置の製造方法 |
US6177337B1 (en) | 1998-01-06 | 2001-01-23 | International Business Machines Corporation | Method of reducing metal voids in semiconductor device interconnection |
Also Published As
Publication number | Publication date |
---|---|
JPS6217373B2 (enrdf_load_stackoverflow) | 1987-04-17 |
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