JPS54102123A - Developing method - Google Patents

Developing method

Info

Publication number
JPS54102123A
JPS54102123A JP874478A JP874478A JPS54102123A JP S54102123 A JPS54102123 A JP S54102123A JP 874478 A JP874478 A JP 874478A JP 874478 A JP874478 A JP 874478A JP S54102123 A JPS54102123 A JP S54102123A
Authority
JP
Japan
Prior art keywords
developer
nozzle
arraying
wafer
injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP874478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6231340B2 (forum.php
Inventor
Mototsugu Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP874478A priority Critical patent/JPS54102123A/ja
Publication of JPS54102123A publication Critical patent/JPS54102123A/ja
Publication of JPS6231340B2 publication Critical patent/JPS6231340B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP874478A 1978-01-27 1978-01-27 Developing method Granted JPS54102123A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP874478A JPS54102123A (en) 1978-01-27 1978-01-27 Developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP874478A JPS54102123A (en) 1978-01-27 1978-01-27 Developing method

Publications (2)

Publication Number Publication Date
JPS54102123A true JPS54102123A (en) 1979-08-11
JPS6231340B2 JPS6231340B2 (forum.php) 1987-07-08

Family

ID=11701436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP874478A Granted JPS54102123A (en) 1978-01-27 1978-01-27 Developing method

Country Status (1)

Country Link
JP (1) JPS54102123A (forum.php)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633834A (en) * 1979-08-29 1981-04-04 Toshiba Corp Manufacturing device of semiconductor
JPS5645022A (en) * 1979-09-21 1981-04-24 Hitachi Ltd Developing method for photo resist
JPS56110933A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Developing method
JPS5950440A (ja) * 1982-09-16 1984-03-23 Fujitsu Ltd レジスト膜の現像方法
JPS5963726A (ja) * 1982-10-05 1984-04-11 Toshiba Corp ホトレジスト現像装置
JPS5978343A (ja) * 1982-10-28 1984-05-07 Fujitsu Ltd レジスト膜の現像方法
JPS5978342A (ja) * 1982-10-28 1984-05-07 Fujitsu Ltd レジスト膜の現像方法
JPS60103830U (ja) * 1983-12-20 1985-07-15 株式会社東芝 回転現像装置
JPS60179957A (ja) * 1984-02-27 1985-09-13 Hitachi Ltd 光ディスクのスピン現像方法及び装置
US4564280A (en) * 1982-10-28 1986-01-14 Fujitsu Limited Method and apparatus for developing resist film including a movable nozzle arm
JPS61276323A (ja) * 1985-05-31 1986-12-06 Toshiba Corp レジストパタ−ンの形成方法
JPS6230336U (forum.php) * 1985-08-07 1987-02-24
JPS62229837A (ja) * 1986-03-29 1987-10-08 Toshiba Corp レジスト現像方法および装置
US5270762A (en) * 1992-03-02 1993-12-14 Eastman Kodak Company Slot impingement for a photographic processing apparatus
WO2003103030A1 (fr) * 2002-06-04 2003-12-11 Tokyo Electron Limited Dispositif et procede de traitement de substrat, et injecteur y relatif

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633834A (en) * 1979-08-29 1981-04-04 Toshiba Corp Manufacturing device of semiconductor
JPS5645022A (en) * 1979-09-21 1981-04-24 Hitachi Ltd Developing method for photo resist
JPS56110933A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Developing method
JPS5950440A (ja) * 1982-09-16 1984-03-23 Fujitsu Ltd レジスト膜の現像方法
JPS5963726A (ja) * 1982-10-05 1984-04-11 Toshiba Corp ホトレジスト現像装置
JPS5978342A (ja) * 1982-10-28 1984-05-07 Fujitsu Ltd レジスト膜の現像方法
JPS5978343A (ja) * 1982-10-28 1984-05-07 Fujitsu Ltd レジスト膜の現像方法
US4564280A (en) * 1982-10-28 1986-01-14 Fujitsu Limited Method and apparatus for developing resist film including a movable nozzle arm
JPS60103830U (ja) * 1983-12-20 1985-07-15 株式会社東芝 回転現像装置
JPS60179957A (ja) * 1984-02-27 1985-09-13 Hitachi Ltd 光ディスクのスピン現像方法及び装置
JPS61276323A (ja) * 1985-05-31 1986-12-06 Toshiba Corp レジストパタ−ンの形成方法
JPS6230336U (forum.php) * 1985-08-07 1987-02-24
JPS62229837A (ja) * 1986-03-29 1987-10-08 Toshiba Corp レジスト現像方法および装置
US5270762A (en) * 1992-03-02 1993-12-14 Eastman Kodak Company Slot impingement for a photographic processing apparatus
WO2003103030A1 (fr) * 2002-06-04 2003-12-11 Tokyo Electron Limited Dispositif et procede de traitement de substrat, et injecteur y relatif

Also Published As

Publication number Publication date
JPS6231340B2 (forum.php) 1987-07-08

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