JPS57164985A - Surface treatment of substrate to be treated - Google Patents

Surface treatment of substrate to be treated

Info

Publication number
JPS57164985A
JPS57164985A JP5098381A JP5098381A JPS57164985A JP S57164985 A JPS57164985 A JP S57164985A JP 5098381 A JP5098381 A JP 5098381A JP 5098381 A JP5098381 A JP 5098381A JP S57164985 A JPS57164985 A JP S57164985A
Authority
JP
Japan
Prior art keywords
clockwise
substrate
rotation
nozzle
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5098381A
Other languages
Japanese (ja)
Other versions
JPS593549B2 (en
Inventor
Nobutoshi Ogami
Takeshi Takada
Mikio Shoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP5098381A priority Critical patent/JPS593549B2/en
Publication of JPS57164985A publication Critical patent/JPS57164985A/en
Publication of JPS593549B2 publication Critical patent/JPS593549B2/en
Expired legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To treat a substrate to be treated uniformly by rotating the substrate alternately in clockwise and counterclockwise directions, and spraying treating liquid from a nozzle onto the surface thereof.
CONSTITUTION: A developing solution is sprayed from a nozzle 13 onto the surface of, for example, a silicon wafer 10; at the same time, the wafer 10 is rotated for about 5sec clockwise at about 250W300rpm by a vacuum chuck rotary plate 12, after which the rotation is stopped. Following to this, it is rotated counterclockwise for the same time at the same rotating speed. The rotation in clockwise and counterclockwise direction are repeated alternately every twice. Next, the rotating speed of the plate 12 is lowered to about 100rpm and the spraying of the developing solution from the nozzle 13 is stopped, thence the rotation in the clockwise and counterclockwise direction similar to the above are repeated alternately twice, when the developing is ended. Thereby, the uniform and accurate developing patterns are obtained.
COPYRIGHT: (C)1982,JPO&Japio
JP5098381A 1981-04-03 1981-04-03 Surface treatment method for substrate to be treated Expired JPS593549B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5098381A JPS593549B2 (en) 1981-04-03 1981-04-03 Surface treatment method for substrate to be treated

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5098381A JPS593549B2 (en) 1981-04-03 1981-04-03 Surface treatment method for substrate to be treated

Publications (2)

Publication Number Publication Date
JPS57164985A true JPS57164985A (en) 1982-10-09
JPS593549B2 JPS593549B2 (en) 1984-01-24

Family

ID=12874028

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5098381A Expired JPS593549B2 (en) 1981-04-03 1981-04-03 Surface treatment method for substrate to be treated

Country Status (1)

Country Link
JP (1) JPS593549B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63232431A (en) * 1987-03-20 1988-09-28 Tokyo Electron Ltd Development device
JPH08321464A (en) * 1996-04-19 1996-12-03 Tokyo Electron Ltd Method of developing

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63232431A (en) * 1987-03-20 1988-09-28 Tokyo Electron Ltd Development device
JPH0740545B2 (en) * 1987-03-20 1995-05-01 東京エレクトロン株式会社 Development method
JPH08321464A (en) * 1996-04-19 1996-12-03 Tokyo Electron Ltd Method of developing

Also Published As

Publication number Publication date
JPS593549B2 (en) 1984-01-24

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