JPS54103034A - Automatic developer - Google Patents
Automatic developerInfo
- Publication number
- JPS54103034A JPS54103034A JP969978A JP969978A JPS54103034A JP S54103034 A JPS54103034 A JP S54103034A JP 969978 A JP969978 A JP 969978A JP 969978 A JP969978 A JP 969978A JP S54103034 A JPS54103034 A JP S54103034A
- Authority
- JP
- Japan
- Prior art keywords
- developing
- turntable
- gases
- samples
- drying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photographic Processing Devices Using Wet Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To automatically accomplish the developing and drying operations by placing a plurality of samples to be developed on a turntable, by sequentially injecting a developing liquid, a rinsing liquid and drying N2 gases from respective injecting nozzles simultaneously with the rotations and by stopping the rotatins simultaneously with the stop of injection of N2 gases.
CONSTITUTION: A plurality of large and rectangular samples 50 such as thermal head substrates are placed on a turntable which is mounted rotatably in a developing tube 1 of sealed construction. The turntable is turned by the control of a control unit 3 for controlling a developing step so that a developing liquid, a rinsing liquid and drying N2 gases are injected in the order specified onto a sample 50 for a preset time from spray nozzles 54, 56 and 57, respectively. Simultaneously as the injection of the N2 gases is stopped, the turntable 4 is stopped. Thus, a plurality of samples can be automatically developed, rinsed and dried to remarkably improve the productivity and reproductivity and to effect stable development.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP969978A JPS54103034A (en) | 1978-01-30 | 1978-01-30 | Automatic developer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP969978A JPS54103034A (en) | 1978-01-30 | 1978-01-30 | Automatic developer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54103034A true JPS54103034A (en) | 1979-08-14 |
JPS6255132B2 JPS6255132B2 (en) | 1987-11-18 |
Family
ID=11727470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP969978A Granted JPS54103034A (en) | 1978-01-30 | 1978-01-30 | Automatic developer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54103034A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633834A (en) * | 1979-08-29 | 1981-04-04 | Toshiba Corp | Manufacturing device of semiconductor |
JPS57173660U (en) * | 1981-04-28 | 1982-11-01 | ||
JPS59104533U (en) * | 1982-12-29 | 1984-07-13 | 富士通株式会社 | Resist processing equipment |
JPS6054449A (en) * | 1983-09-05 | 1985-03-28 | Toshiba Corp | Conveying jig for semiconductor wafer |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4974940A (en) * | 1972-11-17 | 1974-07-19 | ||
JPS49134151U (en) * | 1973-03-20 | 1974-11-18 | ||
JPS51132922A (en) * | 1975-05-14 | 1976-11-18 | Nec Corp | Outline emphasis signal generation apparatus |
-
1978
- 1978-01-30 JP JP969978A patent/JPS54103034A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4974940A (en) * | 1972-11-17 | 1974-07-19 | ||
JPS49134151U (en) * | 1973-03-20 | 1974-11-18 | ||
JPS51132922A (en) * | 1975-05-14 | 1976-11-18 | Nec Corp | Outline emphasis signal generation apparatus |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633834A (en) * | 1979-08-29 | 1981-04-04 | Toshiba Corp | Manufacturing device of semiconductor |
JPS6329406B2 (en) * | 1979-08-29 | 1988-06-14 | Tokyo Shibaura Electric Co | |
JPS57173660U (en) * | 1981-04-28 | 1982-11-01 | ||
JPS59104533U (en) * | 1982-12-29 | 1984-07-13 | 富士通株式会社 | Resist processing equipment |
JPH0356041Y2 (en) * | 1982-12-29 | 1991-12-16 | ||
JPS6054449A (en) * | 1983-09-05 | 1985-03-28 | Toshiba Corp | Conveying jig for semiconductor wafer |
JPH0530063B2 (en) * | 1983-09-05 | 1993-05-07 | Tokyo Shibaura Electric Co |
Also Published As
Publication number | Publication date |
---|---|
JPS6255132B2 (en) | 1987-11-18 |
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