JPS55122873A - Lift off apparatus - Google Patents

Lift off apparatus

Info

Publication number
JPS55122873A
JPS55122873A JP2907879A JP2907879A JPS55122873A JP S55122873 A JPS55122873 A JP S55122873A JP 2907879 A JP2907879 A JP 2907879A JP 2907879 A JP2907879 A JP 2907879A JP S55122873 A JPS55122873 A JP S55122873A
Authority
JP
Japan
Prior art keywords
film
substrate
board
maintaining
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2907879A
Other languages
Japanese (ja)
Inventor
Fumio Hori
Takeshi Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2907879A priority Critical patent/JPS55122873A/en
Publication of JPS55122873A publication Critical patent/JPS55122873A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: To shorten removing time of the following mentioned film compared with usual apparatus and to reduce the cost, by providing dissolution solution dropping means of the film and rotating brush means on the ratating board maintaining the substrate having the metal film to be removed on the photoresist film at a fixed place.
CONSTITUTION: The apparatus is constructed by maintaining the substrate 1 having the metal film 3 to be removed on the photoresist film 2 having a fixed pattern and facing against the rotatable support board 24 and then, providing with the rotating brush 22 contacting with the surface of the substrate 1 and the supply tube 27 of the dissolution solution 26, such as NaOH etc., for removing the above mentioned film 2, 3. The substrate 1 is placed on the groove 25 of the board 24 and is rotated and then, the above film 2, 3 are removed in the time of about one-fifth of the usual apparatus by the friction by the fiber 21 set in the brush 22 rotating reversely and dropping of the solution 26 and moreover, production cost of photomask is reduced sharply.
COPYRIGHT: (C)1980,JPO&Japio
JP2907879A 1979-03-13 1979-03-13 Lift off apparatus Pending JPS55122873A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2907879A JPS55122873A (en) 1979-03-13 1979-03-13 Lift off apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2907879A JPS55122873A (en) 1979-03-13 1979-03-13 Lift off apparatus

Publications (1)

Publication Number Publication Date
JPS55122873A true JPS55122873A (en) 1980-09-20

Family

ID=12266301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2907879A Pending JPS55122873A (en) 1979-03-13 1979-03-13 Lift off apparatus

Country Status (1)

Country Link
JP (1) JPS55122873A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6793778B2 (en) 2002-07-15 2004-09-21 Hitachi Global Storage Technologies Netherlands N.V. Method of fabricating slider pads for a transducer operating with moving magnetic media

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6793778B2 (en) 2002-07-15 2004-09-21 Hitachi Global Storage Technologies Netherlands N.V. Method of fabricating slider pads for a transducer operating with moving magnetic media

Similar Documents

Publication Publication Date Title
JPS542720A (en) Forming method of photopolymerized image
JPS5271871A (en) Washing apparatus
FR2375343B1 (en) PROCESS FOR DEPOSITING AN ANTIREFLECTIVE COATING ON SUBSTRATES OF ORGANIC BASED MATERIAL
JPS5217815A (en) Substrate and material using the same
JPS51120180A (en) Pattern printing device
JPS55122873A (en) Lift off apparatus
JPS5282412A (en) Cleaning method for magnetic magnetic
JPS51120214A (en) Photo-material including antihalation layer
JPS5498574A (en) Rotary coating unit of viscous material
JPS5473576A (en) Spin coating method and spin coater
JPS5413777A (en) Photo resist coater of semiconductor wafers
JPS5379371A (en) Manufacture for plasma display panel
JPS53147531A (en) Forming method for thin film pattern
JPS5431280A (en) Photo resist coating device
JPS5275438A (en) Liquid development means for diazo type copying machine
JPS5222038A (en) Trowel apparatus for coating
JPS5236394A (en) Apparatus for grinding and cleanig inner surface of vertical storage t ank
JPS5226847A (en) Layer forming method for liquid crystal molecule orientation and devic e therefor
JPS5397041A (en) Thin film coater
JPS5240339A (en) Electrophotographic printing machine
JPS5291560A (en) Washing apparatus of coating holder for matter to be coated
JPS5369582A (en) Coating method for photo-resist
JPS5491183A (en) Production of semiconductor device
JPS53108667A (en) Brushing apparatus for cleaning large-diameter hole
JPS5279869A (en) Semiconductor substrate