JPS56130923A - Developing apparatus for semiconductor substrate - Google Patents

Developing apparatus for semiconductor substrate

Info

Publication number
JPS56130923A
JPS56130923A JP3444780A JP3444780A JPS56130923A JP S56130923 A JPS56130923 A JP S56130923A JP 3444780 A JP3444780 A JP 3444780A JP 3444780 A JP3444780 A JP 3444780A JP S56130923 A JPS56130923 A JP S56130923A
Authority
JP
Japan
Prior art keywords
substrate
wafer
developer
semiconductor substrate
rinsing liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3444780A
Other languages
Japanese (ja)
Inventor
Hidemi Amai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3444780A priority Critical patent/JPS56130923A/en
Publication of JPS56130923A publication Critical patent/JPS56130923A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Abstract

PURPOSE:To form a stable and uniform developing state on the entire surface of a wafer by providing automatic conveying-in and -out means, rotatable vacuum chuck, developer discharging means, rinsing liquid injecting means and drying means in an apparatus for developing a semiconductor substrate. CONSTITUTION:A semiconductor substrate 7 is placed by automatic conveying-in means having a supply elevator 1, a supply carrier 2 and a wafer conveying unit 3 on a rotatable vacuum chuck 6 connected to a motor 5, developer is dropped to develop from a developer discharging nozzle 8 on the substrate while rotating at an extremely low speed, rinsing liquid is then injected from rinsing liquid injecting nozzles 9, 9' while rotating the substrate, dry gas is injected from a nozzle 10, the substrate is rotated at a high speed to dry the substrate, and the substrate 7 is subsequently fed out of a wafer conveying-out unit 11. Thus, since fresh developer can be supplied to the entire surface of the wafer, it can be uniformly developed.
JP3444780A 1980-03-18 1980-03-18 Developing apparatus for semiconductor substrate Pending JPS56130923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3444780A JPS56130923A (en) 1980-03-18 1980-03-18 Developing apparatus for semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3444780A JPS56130923A (en) 1980-03-18 1980-03-18 Developing apparatus for semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS56130923A true JPS56130923A (en) 1981-10-14

Family

ID=12414496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3444780A Pending JPS56130923A (en) 1980-03-18 1980-03-18 Developing apparatus for semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS56130923A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0223237A2 (en) * 1985-11-18 1987-05-27 Kabushiki Kaisha Toshiba Automatic developing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0223237A2 (en) * 1985-11-18 1987-05-27 Kabushiki Kaisha Toshiba Automatic developing apparatus

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