JPS536282A - Spattering process and apparatus - Google Patents

Spattering process and apparatus

Info

Publication number
JPS536282A
JPS536282A JP8035277A JP8035277A JPS536282A JP S536282 A JPS536282 A JP S536282A JP 8035277 A JP8035277 A JP 8035277A JP 8035277 A JP8035277 A JP 8035277A JP S536282 A JPS536282 A JP S536282A
Authority
JP
Japan
Prior art keywords
spattering process
spattering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8035277A
Other languages
English (en)
Japanese (ja)
Inventor
Biseru Yan
Biremu Beruguuto Korunerisu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of JPS536282A publication Critical patent/JPS536282A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP8035277A 1976-07-07 1977-07-05 Spattering process and apparatus Pending JPS536282A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7607473A NL7607473A (nl) 1976-07-07 1976-07-07 Verstuifinrichting en werkwijze voor het ver- stuiven met een dergelijke inrichting.

Publications (1)

Publication Number Publication Date
JPS536282A true JPS536282A (en) 1978-01-20

Family

ID=19826537

Family Applications (2)

Application Number Title Priority Date Filing Date
JP8035277A Pending JPS536282A (en) 1976-07-07 1977-07-05 Spattering process and apparatus
JP1983128511U Expired JPS6028689Y2 (ja) 1976-07-07 1983-08-22 スパツタリング装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP1983128511U Expired JPS6028689Y2 (ja) 1976-07-07 1983-08-22 スパツタリング装置

Country Status (14)

Country Link
JP (2) JPS536282A (fr)
AT (1) AT352493B (fr)
AU (1) AU506847B2 (fr)
BR (1) BR7704375A (fr)
CA (1) CA1081656A (fr)
CH (1) CH618289A5 (fr)
DE (1) DE2729286A1 (fr)
ES (1) ES460405A1 (fr)
FR (1) FR2358020A1 (fr)
GB (1) GB1587566A (fr)
IT (1) IT1076083B (fr)
NL (1) NL7607473A (fr)
SE (1) SE7707729L (fr)
ZA (1) ZA773538B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155866U (fr) * 1979-04-20 1980-11-10
JPS59116375A (ja) * 1982-11-26 1984-07-05 Kawasaki Heavy Ind Ltd スパッタリング装置
JPS59179782A (ja) * 1983-03-31 1984-10-12 Kawasaki Heavy Ind Ltd スパツタリング装置の電極部構造
JPS59169352U (ja) * 1983-04-25 1984-11-13 川崎重工業株式会社 スパツタリング装置の電極部構造
JP2013057095A (ja) * 2011-09-07 2013-03-28 Ulvac Japan Ltd マグネトロンスパッタカソード

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4275126A (en) * 1978-04-12 1981-06-23 Battelle Memorial Institute Fuel cell electrode on solid electrolyte substrate
CA1141704A (fr) * 1978-08-21 1983-02-22 Charles F. Morrison, Jr. Dispositif de pulverisation cathodique a uniformite accrue magnetiquement
GB2051877B (en) * 1979-04-09 1983-03-02 Vac Tec Syst Magnetically enhanced sputtering device and method
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
DE3316548C2 (de) * 1983-03-25 1985-01-17 Flachglas AG, 8510 Fürth Verfahren zur Beschichtung eines transparenten Substrates
DE3406953C2 (de) * 1983-04-19 1986-03-13 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Verfahren zum Erwärmen von Heizgut in einem Vakuumrezipienten
CH659346A5 (de) * 1983-05-10 1987-01-15 Balzers Hochvakuum Vorrichtung zum behandeln der innenwand eines rohres.
CH668565A5 (de) * 1986-06-23 1989-01-13 Balzers Hochvakuum Verfahren und anordnung zum zerstaeuben eines materials mittels hochfrequenz.
AT392291B (de) * 1987-09-01 1991-02-25 Miba Gleitlager Ag Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens
DE4018914C1 (fr) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
DE4022708A1 (de) * 1990-07-17 1992-04-02 Balzers Hochvakuum Aetz- oder beschichtungsanlagen
DE4042417C2 (de) * 1990-07-17 1993-11-25 Balzers Hochvakuum Ätz- oder Beschichtungsanlage sowie Verfahren zu ihrem Zünden oder intermittierenden Betreiben
DE4107505A1 (de) * 1991-03-08 1992-09-10 Leybold Ag Verfahren zum betrieb einer sputteranlage und vorrichtung zur durchfuehrung des verfahrens
WO1995032517A1 (fr) * 1994-05-24 1995-11-30 Rossiisko-Shveitsarskoe Aktsionernoe Obschestvo Zakrytogo Tipa 'nova' Procede de production d'une decharge electrique et son dispositif de mise en ×uvre
DE19623359A1 (de) * 1995-08-17 1997-02-20 Leybold Ag Vorrichtung zum Beschichten eines Substrats
DE19652634C2 (de) * 1996-09-13 2002-12-19 Euromat Ges Fuer Werkstofftech Verfahren zum Innenbeschichten eines metallischer Bauteils, insbesondere eines Bauteils mit einem zylindrischen Hohlraum, eine Vorrichtung zu dessen Durchführung sowie die Verwendung des Verfahrens
DE19727647A1 (de) * 1997-06-12 1998-12-17 Leybold Ag Vorrichtung zum Beschichten eines Substratkörpers mittels Kathodenzerstäubung
US20150114828A1 (en) * 2013-10-31 2015-04-30 General Electric Company Systems and method of coating an interior surface of an object
US9111734B2 (en) 2013-10-31 2015-08-18 General Electric Company Systems and method of coating an interior surface of an object
JP2022178656A (ja) * 2021-05-20 2022-12-02 大学共同利用機関法人 高エネルギー加速器研究機構 非蒸発型ゲッタコーティング装置、非蒸発型ゲッタコーティング容器・配管の製造方法、非蒸発型ゲッタコーティング容器・配管

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945849A (fr) * 1972-09-08 1974-05-01

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884793A (en) * 1971-09-07 1975-05-20 Telic Corp Electrode type glow discharge apparatus
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945849A (fr) * 1972-09-08 1974-05-01

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55155866U (fr) * 1979-04-20 1980-11-10
JPS584923Y2 (ja) * 1979-04-20 1983-01-27 株式会社 徳田製作所 横型スパッタリング装置
JPS59116375A (ja) * 1982-11-26 1984-07-05 Kawasaki Heavy Ind Ltd スパッタリング装置
JPS59179782A (ja) * 1983-03-31 1984-10-12 Kawasaki Heavy Ind Ltd スパツタリング装置の電極部構造
JPS59169352U (ja) * 1983-04-25 1984-11-13 川崎重工業株式会社 スパツタリング装置の電極部構造
JP2013057095A (ja) * 2011-09-07 2013-03-28 Ulvac Japan Ltd マグネトロンスパッタカソード

Also Published As

Publication number Publication date
BR7704375A (pt) 1978-05-16
JPS6028689Y2 (ja) 1985-08-30
CA1081656A (fr) 1980-07-15
FR2358020B1 (fr) 1982-11-12
AT352493B (de) 1979-09-25
GB1587566A (en) 1981-04-08
SE7707729L (sv) 1978-01-08
FR2358020A1 (fr) 1978-02-03
ATA482777A (de) 1979-02-15
CH618289A5 (en) 1980-07-15
JPS5947654U (ja) 1984-03-29
NL7607473A (nl) 1978-01-10
DE2729286A1 (de) 1978-01-12
AU506847B2 (en) 1980-01-24
DE2729286C2 (fr) 1988-05-11
ZA773538B (en) 1979-01-31
IT1076083B (it) 1985-04-22
ES460405A1 (es) 1978-05-01
AU2668877A (en) 1979-01-04

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