JPS5339071A - Forming method of insulator layer - Google Patents

Forming method of insulator layer

Info

Publication number
JPS5339071A
JPS5339071A JP11309676A JP11309676A JPS5339071A JP S5339071 A JPS5339071 A JP S5339071A JP 11309676 A JP11309676 A JP 11309676A JP 11309676 A JP11309676 A JP 11309676A JP S5339071 A JPS5339071 A JP S5339071A
Authority
JP
Japan
Prior art keywords
vessel
forming method
insulator layer
al2o3
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11309676A
Other languages
English (en)
Inventor
Kazuyoshi Ueki
Takashi Nishida
Yukiyoshi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11309676A priority Critical patent/JPS5339071A/ja
Publication of JPS5339071A publication Critical patent/JPS5339071A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP11309676A 1976-09-22 1976-09-22 Forming method of insulator layer Pending JPS5339071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11309676A JPS5339071A (en) 1976-09-22 1976-09-22 Forming method of insulator layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11309676A JPS5339071A (en) 1976-09-22 1976-09-22 Forming method of insulator layer

Publications (1)

Publication Number Publication Date
JPS5339071A true JPS5339071A (en) 1978-04-10

Family

ID=14603366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11309676A Pending JPS5339071A (en) 1976-09-22 1976-09-22 Forming method of insulator layer

Country Status (1)

Country Link
JP (1) JPS5339071A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008202347A (ja) * 2007-02-21 2008-09-04 Nippon Steel Corp 合成セグメント

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008202347A (ja) * 2007-02-21 2008-09-04 Nippon Steel Corp 合成セグメント

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