JPS5261482A - Photo etching - Google Patents
Photo etchingInfo
- Publication number
- JPS5261482A JPS5261482A JP13797175A JP13797175A JPS5261482A JP S5261482 A JPS5261482 A JP S5261482A JP 13797175 A JP13797175 A JP 13797175A JP 13797175 A JP13797175 A JP 13797175A JP S5261482 A JPS5261482 A JP S5261482A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- photo etching
- resist
- throug
- dissolves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13797175A JPS5261482A (en) | 1975-11-17 | 1975-11-17 | Photo etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13797175A JPS5261482A (en) | 1975-11-17 | 1975-11-17 | Photo etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5261482A true JPS5261482A (en) | 1977-05-20 |
Family
ID=15211011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13797175A Pending JPS5261482A (en) | 1975-11-17 | 1975-11-17 | Photo etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5261482A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5844720A (ja) * | 1981-07-15 | 1983-03-15 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | 開孔パタ−ン形成方法 |
JPS59123232A (ja) * | 1982-12-28 | 1984-07-17 | Toshiba Corp | スプレー現像方法及びその装置 |
JPS61220328A (ja) * | 1985-03-22 | 1986-09-30 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | リフト・オフ・マスクの製造方法 |
-
1975
- 1975-11-17 JP JP13797175A patent/JPS5261482A/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5844720A (ja) * | 1981-07-15 | 1983-03-15 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | 開孔パタ−ン形成方法 |
JPS6357941B2 (ja) * | 1981-07-15 | 1988-11-14 | Intaanashonaru Bijinesu Mashiinzu Corp | |
JPS59123232A (ja) * | 1982-12-28 | 1984-07-17 | Toshiba Corp | スプレー現像方法及びその装置 |
JPS6361770B2 (ja) * | 1982-12-28 | 1988-11-30 | ||
JPS61220328A (ja) * | 1985-03-22 | 1986-09-30 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | リフト・オフ・マスクの製造方法 |
JPH033378B2 (ja) * | 1985-03-22 | 1991-01-18 | Intaanashonaru Bijinesu Mashiinzu Corp |
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