Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co LtdfiledCriticalMatsushita Electric Industrial Co Ltd
Priority to JP50135809ApriorityCriticalpatent/JPS5259581A/en
Publication of JPS5259581ApublicationCriticalpatent/JPS5259581A/en
PURPOSE: To perform etching accurately with good controllability by separating an etching solution into two regions, applying a voltage to both regions and perform etching thile observing the current flowing in the etching solution.
COPYRIGHT: (C)1977,JPO&Japio
JP50135809A1975-11-111975-11-11Process and device for production of semiconductor device
PendingJPS5259581A
(en)