JPS51132763A - Production method of semiconductor device - Google Patents

Production method of semiconductor device

Info

Publication number
JPS51132763A
JPS51132763A JP5608175A JP5608175A JPS51132763A JP S51132763 A JPS51132763 A JP S51132763A JP 5608175 A JP5608175 A JP 5608175A JP 5608175 A JP5608175 A JP 5608175A JP S51132763 A JPS51132763 A JP S51132763A
Authority
JP
Japan
Prior art keywords
semiconductor device
production method
polyimidelayer
caked
layered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5608175A
Other languages
Japanese (ja)
Inventor
Katsuo Sugawara
Tatsu Ito
Tsunao Tsukikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5608175A priority Critical patent/JPS51132763A/en
Publication of JPS51132763A publication Critical patent/JPS51132763A/en
Pending legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE: In order to form a smooth and inclined plane on the stepped section, with high withstand voltage, by means of forming multi-layered polyimidelayer being sequentially caked with the temperature from the high to the low on a insulation film.
COPYRIGHT: (C)1976,JPO&Japio
JP5608175A 1975-05-14 1975-05-14 Production method of semiconductor device Pending JPS51132763A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5608175A JPS51132763A (en) 1975-05-14 1975-05-14 Production method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5608175A JPS51132763A (en) 1975-05-14 1975-05-14 Production method of semiconductor device

Publications (1)

Publication Number Publication Date
JPS51132763A true JPS51132763A (en) 1976-11-18

Family

ID=13017122

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5608175A Pending JPS51132763A (en) 1975-05-14 1975-05-14 Production method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS51132763A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106148A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPS5831558A (en) * 1981-08-18 1983-02-24 Fujitsu Ltd Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106148A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPS6157703B2 (en) * 1980-12-24 1986-12-08 Fujitsu Ltd
JPS5831558A (en) * 1981-08-18 1983-02-24 Fujitsu Ltd Manufacture of semiconductor device

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