JPS51137382A - Measuring method for junction point within semi conductor wafer - Google Patents
Measuring method for junction point within semi conductor waferInfo
- Publication number
- JPS51137382A JPS51137382A JP50061652A JP6165275A JPS51137382A JP S51137382 A JPS51137382 A JP S51137382A JP 50061652 A JP50061652 A JP 50061652A JP 6165275 A JP6165275 A JP 6165275A JP S51137382 A JPS51137382 A JP S51137382A
- Authority
- JP
- Japan
- Prior art keywords
- junction point
- measuring method
- semi conductor
- conductor wafer
- measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE: Junction point measuring method with short easy operation, measuring time, and high accuracy in measuring the junction point within semi conductor W after.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50061652A JPS59970B2 (en) | 1975-05-22 | 1975-05-22 | How to use the handbook |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50061652A JPS59970B2 (en) | 1975-05-22 | 1975-05-22 | How to use the handbook |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51137382A true JPS51137382A (en) | 1976-11-27 |
JPS59970B2 JPS59970B2 (en) | 1984-01-10 |
Family
ID=13177360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50061652A Expired JPS59970B2 (en) | 1975-05-22 | 1975-05-22 | How to use the handbook |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59970B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0521564A (en) * | 1991-07-12 | 1993-01-29 | Toshiba Corp | Measuring apparatus for diffusion layer depth |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6142478U (en) * | 1984-08-24 | 1986-03-19 | 沖電気工業株式会社 | Burn-in equipment for semiconductor devices |
-
1975
- 1975-05-22 JP JP50061652A patent/JPS59970B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0521564A (en) * | 1991-07-12 | 1993-01-29 | Toshiba Corp | Measuring apparatus for diffusion layer depth |
Also Published As
Publication number | Publication date |
---|---|
JPS59970B2 (en) | 1984-01-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51117078A (en) | Magnetic field measuring method | |
JPS51115775A (en) | Semiconductor apparatus | |
JPS51137382A (en) | Measuring method for junction point within semi conductor wafer | |
JPS5228868A (en) | Semiconductor device | |
JPS51135474A (en) | To analyze a semiconductor device | |
JPS51136190A (en) | Pin jack terminal plate manufacturing method with its practical device | |
JPS5227378A (en) | Wafer test method | |
JPS5227280A (en) | Method to form pinholes | |
JPS51122381A (en) | Semiconductor device for ultra low temperature | |
JPS51115777A (en) | Manufacturing method of a semiconductor apparatus | |
JPS5245274A (en) | Method for inspection before perfection of transistor | |
JPS5379461A (en) | Semiconductor device and its manufacturing process | |
JPS5240075A (en) | Wafer prober | |
JPS51140638A (en) | Positioning method | |
JPS5217686A (en) | Cable junctio process | |
JPS5258367A (en) | Formation of contact holes in semiconductor device | |
JPS51132985A (en) | Semiconductor device | |
JPS51140571A (en) | Method for forming a semiconductor protective film | |
JPS51118960A (en) | Wafer form semiconductor doping material | |
JPS51151088A (en) | Manufacturing method of a semiconductor integrated circuit apparatus | |
JPS5227379A (en) | Threshold voltage measuring system of mos-type semiconductor device | |
JPS5212491A (en) | Electeric wire jointing method and device | |
JPS52108877A (en) | Apparatus for use with mass spectrometer for automatically detecting a nd setting peak-top of mass number | |
JPS52141561A (en) | Ion injection | |
JPS51121279A (en) | Junction breakdown type semiconductor memory device |