JPS5232260A - Alignment equipment for shadow mask - Google Patents
Alignment equipment for shadow maskInfo
- Publication number
- JPS5232260A JPS5232260A JP10797975A JP10797975A JPS5232260A JP S5232260 A JPS5232260 A JP S5232260A JP 10797975 A JP10797975 A JP 10797975A JP 10797975 A JP10797975 A JP 10797975A JP S5232260 A JPS5232260 A JP S5232260A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- increased
- brightness
- pins
- mold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: Brightness is increased drastically by fine moving hole positions to be positioned highly accurately making a few spring 5 on outer circumference of the frame welded in advance are fixed at pins 6 outside the mold 2. By a microscope 7 mounte don a base 8 on which pins 6 are ifxed, mask 3 holes are observed, and are adjusted by moving together with the mold 2 fixing the mask 3 until hole positions are positioned at an ideal position. Later at a point in time the mask 3 is fixed at a desired position relative to the reference pin 6, the mask 3 is welded outside the frame. Thus, position errors of the mask 3 become very small, and the largeness of fluorescent dots can be increased, i.e., brightness can be increased greatly.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10797975A JPS5232260A (en) | 1975-09-08 | 1975-09-08 | Alignment equipment for shadow mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10797975A JPS5232260A (en) | 1975-09-08 | 1975-09-08 | Alignment equipment for shadow mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5232260A true JPS5232260A (en) | 1977-03-11 |
Family
ID=14472896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10797975A Pending JPS5232260A (en) | 1975-09-08 | 1975-09-08 | Alignment equipment for shadow mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5232260A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5025191A (en) * | 1989-12-21 | 1991-06-18 | Zenith Electronics Corporation | Adjustable-height shadow mask support for a flat tension mask color cathode ray tube |
-
1975
- 1975-09-08 JP JP10797975A patent/JPS5232260A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5025191A (en) * | 1989-12-21 | 1991-06-18 | Zenith Electronics Corporation | Adjustable-height shadow mask support for a flat tension mask color cathode ray tube |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51111076A (en) | Exposure device | |
JPS51120180A (en) | Pattern printing device | |
JPS5232260A (en) | Alignment equipment for shadow mask | |
JPS5211774A (en) | Method of detecting relative position of patterns | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5352072A (en) | Pattern for alignment | |
JPS542668A (en) | Manufacture of semiconductor device | |
JPS5251874A (en) | Electron beam exposure device | |
JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
JPS5361280A (en) | Pattern projector | |
JPS52117077A (en) | Electron beam-exposing method | |
JPS5431282A (en) | Pattern formation method | |
JPS5251870A (en) | Electron bean exposure method | |
JPS5442979A (en) | Electron beam exposure device | |
JPS51145270A (en) | Method of errosive-printing elaborate pattern on metal plate, semicond uctor, etc. | |
JPS53143175A (en) | Electron beam drawing apparatus | |
JPS5277671A (en) | Method and equipment of masking | |
JPS51118968A (en) | Electron beam exposure device | |
JPS5388728A (en) | Method of forming pattern | |
JPS51148370A (en) | Electron ray exposure method | |
JPS51139267A (en) | Photo-mask | |
JPS53120277A (en) | Electron beam exposure device | |
JPS5437685A (en) | Electron beam exposure unit | |
JPS53127267A (en) | Inspection method for pattern | |
JPS53117463A (en) | Position detection method |