JPS52146174A - Susceptor for vapor growth of semiconductor - Google Patents

Susceptor for vapor growth of semiconductor

Info

Publication number
JPS52146174A
JPS52146174A JP6268476A JP6268476A JPS52146174A JP S52146174 A JPS52146174 A JP S52146174A JP 6268476 A JP6268476 A JP 6268476A JP 6268476 A JP6268476 A JP 6268476A JP S52146174 A JPS52146174 A JP S52146174A
Authority
JP
Japan
Prior art keywords
susceptor
semiconductor
vapor growth
body layer
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6268476A
Other languages
Japanese (ja)
Other versions
JPS5850410B2 (en
Inventor
Asaji Kawanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6268476A priority Critical patent/JPS5850410B2/en
Publication of JPS52146174A publication Critical patent/JPS52146174A/en
Publication of JPS5850410B2 publication Critical patent/JPS5850410B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To prepare a susceptor for vapor growth by providing carbon-confined layers on the surface of a carbon body layer, which layers are better than the body layer in conductivity.
JP6268476A 1976-05-29 1976-05-29 Susceptor for semiconductor vapor phase growth Expired JPS5850410B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6268476A JPS5850410B2 (en) 1976-05-29 1976-05-29 Susceptor for semiconductor vapor phase growth

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6268476A JPS5850410B2 (en) 1976-05-29 1976-05-29 Susceptor for semiconductor vapor phase growth

Publications (2)

Publication Number Publication Date
JPS52146174A true JPS52146174A (en) 1977-12-05
JPS5850410B2 JPS5850410B2 (en) 1983-11-10

Family

ID=13207346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6268476A Expired JPS5850410B2 (en) 1976-05-29 1976-05-29 Susceptor for semiconductor vapor phase growth

Country Status (1)

Country Link
JP (1) JPS5850410B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522140U (en) * 1978-07-28 1980-02-13
JPS55121649A (en) * 1979-03-14 1980-09-18 Pioneer Electronic Corp Cvd device
JPS5932123A (en) * 1982-08-18 1984-02-21 Sony Corp Vapor growth method
JP2010245396A (en) * 2009-04-08 2010-10-28 Sumco Corp Manufacturing method and laminating apparatus for soi wafer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522140U (en) * 1978-07-28 1980-02-13
JPS5742174Y2 (en) * 1978-07-28 1982-09-17
JPS55121649A (en) * 1979-03-14 1980-09-18 Pioneer Electronic Corp Cvd device
JPS5932123A (en) * 1982-08-18 1984-02-21 Sony Corp Vapor growth method
JP2010245396A (en) * 2009-04-08 2010-10-28 Sumco Corp Manufacturing method and laminating apparatus for soi wafer

Also Published As

Publication number Publication date
JPS5850410B2 (en) 1983-11-10

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