JPS52142637A - Plasma etching device - Google Patents

Plasma etching device

Info

Publication number
JPS52142637A
JPS52142637A JP5967076A JP5967076A JPS52142637A JP S52142637 A JPS52142637 A JP S52142637A JP 5967076 A JP5967076 A JP 5967076A JP 5967076 A JP5967076 A JP 5967076A JP S52142637 A JPS52142637 A JP S52142637A
Authority
JP
Japan
Prior art keywords
plasma etching
etching device
plasma
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5967076A
Other languages
Japanese (ja)
Other versions
JPS5432740B2 (en
Inventor
Seitarou Matsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP5967076A priority Critical patent/JPS52142637A/en
Publication of JPS52142637A publication Critical patent/JPS52142637A/en
Publication of JPS5432740B2 publication Critical patent/JPS5432740B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP5967076A 1976-05-25 1976-05-25 Plasma etching device Granted JPS52142637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5967076A JPS52142637A (en) 1976-05-25 1976-05-25 Plasma etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5967076A JPS52142637A (en) 1976-05-25 1976-05-25 Plasma etching device

Publications (2)

Publication Number Publication Date
JPS52142637A true JPS52142637A (en) 1977-11-28
JPS5432740B2 JPS5432740B2 (en) 1979-10-16

Family

ID=13119845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5967076A Granted JPS52142637A (en) 1976-05-25 1976-05-25 Plasma etching device

Country Status (1)

Country Link
JP (1) JPS52142637A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347662U (en) * 1977-10-24 1978-04-22
JPS63260032A (en) * 1986-09-19 1988-10-27 Tokyo Ohka Kogyo Co Ltd Removal of organic film
JPH08172078A (en) * 1995-07-25 1996-07-02 Tokyo Ohka Kogyo Co Ltd Plasma reaction treater

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5347662U (en) * 1977-10-24 1978-04-22
JPS63260032A (en) * 1986-09-19 1988-10-27 Tokyo Ohka Kogyo Co Ltd Removal of organic film
JPH08172078A (en) * 1995-07-25 1996-07-02 Tokyo Ohka Kogyo Co Ltd Plasma reaction treater

Also Published As

Publication number Publication date
JPS5432740B2 (en) 1979-10-16

Similar Documents

Publication Publication Date Title
JPS5518400A (en) Plasma etching device
IL57889A (en) Device fabrication by plasma etching
IL57888A0 (en) Device fabrication by plasma etching
JPS52115752A (en) Etching liquid
JPS5450440A (en) Plasma etching device
JPS5376139A (en) Silicon etch component
GB1522059A (en) Plasma etching
JPS52122236A (en) Etching device
GB1552268A (en) Semiconductor etching
JPS532361A (en) Etching method
JPS52142637A (en) Plasma etching device
JPS5330435A (en) Etching liquid
JPS52108351A (en) Etching liquid
JPS5364636A (en) Dry etching device
JPS52114444A (en) Plasma etching method
JPS5452985A (en) Etching device
JPS532121A (en) Plasma marking device
JPS5368642A (en) Plasma etching method
JPS536239A (en) Plasma etching method
JPS52107247A (en) Etching liquid
JPS5323843A (en) Plasma etching method
JPS5358671A (en) Etching system
JPS5291745A (en) Device for gas plasma etching
JPS52108349A (en) Etching method
JPS54139380A (en) Etching device