JPS5291745A - Device for gas plasma etching - Google Patents

Device for gas plasma etching

Info

Publication number
JPS5291745A
JPS5291745A JP795876A JP795876A JPS5291745A JP S5291745 A JPS5291745 A JP S5291745A JP 795876 A JP795876 A JP 795876A JP 795876 A JP795876 A JP 795876A JP S5291745 A JPS5291745 A JP S5291745A
Authority
JP
Japan
Prior art keywords
plasma etching
gas plasma
gas
etching
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP795876A
Other languages
Japanese (ja)
Other versions
JPS5526188B2 (en
Inventor
Kousuke Sumitomo
Shinichi Yamamoto
Masahiro Shibagaki
Yasuhiro Horiike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP795876A priority Critical patent/JPS5291745A/en
Publication of JPS5291745A publication Critical patent/JPS5291745A/en
Publication of JPS5526188B2 publication Critical patent/JPS5526188B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP795876A 1976-01-29 1976-01-29 Device for gas plasma etching Granted JPS5291745A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP795876A JPS5291745A (en) 1976-01-29 1976-01-29 Device for gas plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP795876A JPS5291745A (en) 1976-01-29 1976-01-29 Device for gas plasma etching

Publications (2)

Publication Number Publication Date
JPS5291745A true JPS5291745A (en) 1977-08-02
JPS5526188B2 JPS5526188B2 (en) 1980-07-11

Family

ID=11679985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP795876A Granted JPS5291745A (en) 1976-01-29 1976-01-29 Device for gas plasma etching

Country Status (1)

Country Link
JP (1) JPS5291745A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6213030A (en) * 1985-07-11 1987-01-21 Matsushita Electric Ind Co Ltd Vacuum device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921340A (en) * 1972-06-17 1974-02-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921340A (en) * 1972-06-17 1974-02-25

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6213030A (en) * 1985-07-11 1987-01-21 Matsushita Electric Ind Co Ltd Vacuum device

Also Published As

Publication number Publication date
JPS5526188B2 (en) 1980-07-11

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