GB1522059A - Plasma etching - Google Patents

Plasma etching

Info

Publication number
GB1522059A
GB1522059A GB4332576A GB4332576A GB1522059A GB 1522059 A GB1522059 A GB 1522059A GB 4332576 A GB4332576 A GB 4332576A GB 4332576 A GB4332576 A GB 4332576A GB 1522059 A GB1522059 A GB 1522059A
Authority
GB
United Kingdom
Prior art keywords
plasma etching
etching
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4332576A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB4332576A priority Critical patent/GB1522059A/en
Publication of GB1522059A publication Critical patent/GB1522059A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
    • C04B41/5338—Etching
    • C04B41/5346—Dry etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
GB4332576A 1976-10-19 1976-10-19 Plasma etching Expired GB1522059A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB4332576A GB1522059A (en) 1976-10-19 1976-10-19 Plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4332576A GB1522059A (en) 1976-10-19 1976-10-19 Plasma etching

Publications (1)

Publication Number Publication Date
GB1522059A true GB1522059A (en) 1978-08-23

Family

ID=10428279

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4332576A Expired GB1522059A (en) 1976-10-19 1976-10-19 Plasma etching

Country Status (1)

Country Link
GB (1) GB1522059A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0016603A1 (en) * 1979-03-19 1980-10-01 Fujitsu Limited A method for processing substrate materials by means of treating plasma
US4282077A (en) * 1980-07-03 1981-08-04 General Dynamics, Pomona Division Uniform plasma etching system
US4289598A (en) * 1980-05-03 1981-09-15 Technics, Inc. Plasma reactor and method therefor
FR2541509A1 (en) * 1982-01-06 1984-08-24 Drytek Inc DEVICE FOR ACTING GAS PLASMA ON WORKPIECES
EP0143479A1 (en) * 1983-10-19 1985-06-05 Johannes Hendrikus Leonardus Hanssen Plasma-stimulated chemical vapour deposition device and, in particular, a substrate supporting and electrode disposition and associated components
EP0428161A2 (en) * 1989-11-15 1991-05-22 Kokusai Electric Co., Ltd. Dry process system
CN106683971A (en) * 2017-01-06 2017-05-17 珠海宝丰堂电子科技有限公司 Etching electrode device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0016603A1 (en) * 1979-03-19 1980-10-01 Fujitsu Limited A method for processing substrate materials by means of treating plasma
US4289598A (en) * 1980-05-03 1981-09-15 Technics, Inc. Plasma reactor and method therefor
WO1983001075A1 (en) * 1980-05-03 1983-03-31 Frank Wesley Engle Plasma reactor and method therefor
US4282077A (en) * 1980-07-03 1981-08-04 General Dynamics, Pomona Division Uniform plasma etching system
FR2541509A1 (en) * 1982-01-06 1984-08-24 Drytek Inc DEVICE FOR ACTING GAS PLASMA ON WORKPIECES
EP0143479A1 (en) * 1983-10-19 1985-06-05 Johannes Hendrikus Leonardus Hanssen Plasma-stimulated chemical vapour deposition device and, in particular, a substrate supporting and electrode disposition and associated components
EP0428161A2 (en) * 1989-11-15 1991-05-22 Kokusai Electric Co., Ltd. Dry process system
EP0428161A3 (en) * 1989-11-15 1991-07-31 Kokusai Electric Co., Ltd. Dry process system
US5795452A (en) * 1989-11-15 1998-08-18 Kokusai Electric Co., Ltd. Dry process system
CN106683971A (en) * 2017-01-06 2017-05-17 珠海宝丰堂电子科技有限公司 Etching electrode device

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19931019