JPS536239A - Plasma etching method - Google Patents

Plasma etching method

Info

Publication number
JPS536239A
JPS536239A JP8154376A JP8154376A JPS536239A JP S536239 A JPS536239 A JP S536239A JP 8154376 A JP8154376 A JP 8154376A JP 8154376 A JP8154376 A JP 8154376A JP S536239 A JPS536239 A JP S536239A
Authority
JP
Japan
Prior art keywords
plasma etching
etching method
plasma
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8154376A
Other languages
Japanese (ja)
Inventor
Soukichi Yamagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP8154376A priority Critical patent/JPS536239A/en
Publication of JPS536239A publication Critical patent/JPS536239A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP8154376A 1976-07-08 1976-07-08 Plasma etching method Pending JPS536239A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8154376A JPS536239A (en) 1976-07-08 1976-07-08 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8154376A JPS536239A (en) 1976-07-08 1976-07-08 Plasma etching method

Publications (1)

Publication Number Publication Date
JPS536239A true JPS536239A (en) 1978-01-20

Family

ID=13749200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8154376A Pending JPS536239A (en) 1976-07-08 1976-07-08 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS536239A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776844A (en) * 1980-10-31 1982-05-14 Fujitsu Ltd Method and apparatus for processing microwave plasma
JPS5796528A (en) * 1980-12-09 1982-06-15 Fujitsu Ltd Microwave plasma treating device
JPS57184224A (en) * 1981-05-08 1982-11-12 Fujitsu Ltd Microwave plasma treating method and its device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776844A (en) * 1980-10-31 1982-05-14 Fujitsu Ltd Method and apparatus for processing microwave plasma
JPS5796528A (en) * 1980-12-09 1982-06-15 Fujitsu Ltd Microwave plasma treating device
JPS57184224A (en) * 1981-05-08 1982-11-12 Fujitsu Ltd Microwave plasma treating method and its device
JPH0415613B2 (en) * 1981-05-08 1992-03-18 Fujitsu Ltd

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