JPS5432740B2 - - Google Patents
Info
- Publication number
- JPS5432740B2 JPS5432740B2 JP5967076A JP5967076A JPS5432740B2 JP S5432740 B2 JPS5432740 B2 JP S5432740B2 JP 5967076 A JP5967076 A JP 5967076A JP 5967076 A JP5967076 A JP 5967076A JP S5432740 B2 JPS5432740 B2 JP S5432740B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5967076A JPS52142637A (en) | 1976-05-25 | 1976-05-25 | Plasma etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5967076A JPS52142637A (en) | 1976-05-25 | 1976-05-25 | Plasma etching device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52142637A JPS52142637A (en) | 1977-11-28 |
| JPS5432740B2 true JPS5432740B2 (en) | 1979-10-16 |
Family
ID=13119845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5967076A Granted JPS52142637A (en) | 1976-05-25 | 1976-05-25 | Plasma etching device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52142637A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5347662U (en) * | 1977-10-24 | 1978-04-22 | ||
| JP2624243B2 (en) * | 1986-09-19 | 1997-06-25 | 東京応化工業株式会社 | Organic film removal method |
| JP2920874B2 (en) * | 1995-07-25 | 1999-07-19 | 東京応化工業株式会社 | Plasma reaction processing equipment |
-
1976
- 1976-05-25 JP JP5967076A patent/JPS52142637A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52142637A (en) | 1977-11-28 |