JPS52107247A - Etching liquid - Google Patents
Etching liquidInfo
- Publication number
- JPS52107247A JPS52107247A JP2436676A JP2436676A JPS52107247A JP S52107247 A JPS52107247 A JP S52107247A JP 2436676 A JP2436676 A JP 2436676A JP 2436676 A JP2436676 A JP 2436676A JP S52107247 A JPS52107247 A JP S52107247A
- Authority
- JP
- Japan
- Prior art keywords
- etching liquid
- etching
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2436676A JPS6053461B2 (en) | 1976-03-06 | 1976-03-06 | Etching solution used to expose crystal defects in silicon wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2436676A JPS6053461B2 (en) | 1976-03-06 | 1976-03-06 | Etching solution used to expose crystal defects in silicon wafers |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52107247A true JPS52107247A (en) | 1977-09-08 |
JPS6053461B2 JPS6053461B2 (en) | 1985-11-26 |
Family
ID=12136184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2436676A Expired JPS6053461B2 (en) | 1976-03-06 | 1976-03-06 | Etching solution used to expose crystal defects in silicon wafers |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6053461B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7314766B2 (en) | 2002-11-14 | 2008-01-01 | Kabushiki Kaisha Toshiba | Semiconductor wafer treatment method, semiconductor wafer inspection method, semiconductor device development method and semiconductor wafer treatment apparatus |
CN103361643A (en) * | 2013-07-22 | 2013-10-23 | 中国科学院苏州纳米技术与纳米仿生研究所 | GaN corrosive liquid |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02126754U (en) * | 1989-03-24 | 1990-10-18 |
-
1976
- 1976-03-06 JP JP2436676A patent/JPS6053461B2/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7314766B2 (en) | 2002-11-14 | 2008-01-01 | Kabushiki Kaisha Toshiba | Semiconductor wafer treatment method, semiconductor wafer inspection method, semiconductor device development method and semiconductor wafer treatment apparatus |
CN103361643A (en) * | 2013-07-22 | 2013-10-23 | 中国科学院苏州纳米技术与纳米仿生研究所 | GaN corrosive liquid |
Also Published As
Publication number | Publication date |
---|---|
JPS6053461B2 (en) | 1985-11-26 |
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