JPS52129381A - Production of photo mask - Google Patents
Production of photo maskInfo
- Publication number
- JPS52129381A JPS52129381A JP4542576A JP4542576A JPS52129381A JP S52129381 A JPS52129381 A JP S52129381A JP 4542576 A JP4542576 A JP 4542576A JP 4542576 A JP4542576 A JP 4542576A JP S52129381 A JPS52129381 A JP S52129381A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- production
- resist
- photo
- patterning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4542576A JPS52129381A (en) | 1976-04-23 | 1976-04-23 | Production of photo mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4542576A JPS52129381A (en) | 1976-04-23 | 1976-04-23 | Production of photo mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52129381A true JPS52129381A (en) | 1977-10-29 |
| JPS5624260B2 JPS5624260B2 (member.php) | 1981-06-04 |
Family
ID=12718911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4542576A Granted JPS52129381A (en) | 1976-04-23 | 1976-04-23 | Production of photo mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52129381A (member.php) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6169495A (ja) * | 1985-09-17 | 1986-04-10 | 株式会社日立製作所 | 磁気通帳 |
-
1976
- 1976-04-23 JP JP4542576A patent/JPS52129381A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5624260B2 (member.php) | 1981-06-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS51120180A (en) | Pattern printing device | |
| JPS52129381A (en) | Production of photo mask | |
| JPS51126073A (en) | Pattern printing equpment made available by photo-etching method | |
| JPS52117077A (en) | Electron beam-exposing method | |
| JPS5217530A (en) | Method for masking an inorganic coating | |
| JPS5373073A (en) | Treatment method for photo resist | |
| JPS5277671A (en) | Method and equipment of masking | |
| JPS5210063A (en) | Method for manufacturing electron tube | |
| JPS5339060A (en) | Lot number marking method to wafers | |
| JPS53112671A (en) | Forming method for pattern | |
| JPS5376757A (en) | Photoetching method | |
| FR2237226A1 (en) | Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer | |
| JPS5210680A (en) | Method of manufacturing photo-mask for photo etching | |
| JPS5382173A (en) | Positioning method | |
| JPS5382268A (en) | Production of mask | |
| JPS5429975A (en) | Photo mask | |
| JPS53105982A (en) | Micropattern formation method | |
| JPS5325366A (en) | Plasma treating method and apparat us | |
| JPS5429976A (en) | Manufacture of semiconductor device | |
| JPS5217529A (en) | Masking method | |
| JPS5255867A (en) | Exposure method | |
| JPS5397374A (en) | Mask producing method | |
| JPS53114676A (en) | Electron beam exposure method | |
| JPS5255381A (en) | Photo exposure method | |
| JPS545659A (en) | Manufacture of semiconductor device |