JPH1174564A - Ｉｉｉ族窒化物光電子半導体装置 - Google Patents

Ｉｉｉ族窒化物光電子半導体装置

Info

Publication number
JPH1174564A
JPH1174564A JP19473398A JP19473398A JPH1174564A JP H1174564 A JPH1174564 A JP H1174564A JP 19473398 A JP19473398 A JP 19473398A JP 19473398 A JP19473398 A JP 19473398A JP H1174564 A JPH1174564 A JP H1174564A
Authority
JP
Japan
Prior art keywords
layer
graded layer
cladding
region
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19473398A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1174564A5 (enExample
Inventor
Geoffrey Duggan
ダガン ジェフリー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of JPH1174564A publication Critical patent/JPH1174564A/ja
Publication of JPH1174564A5 publication Critical patent/JPH1174564A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
    • H01S5/32341—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/81—Bodies
    • H10H20/822—Materials of the light-emitting regions
    • H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3201—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures incorporating bulkstrain effects, e.g. strain compensation, strain related to polarisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
    • H01S5/3215—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities graded composition cladding layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/3409—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers special GRINSCH structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Led Devices (AREA)
  • Semiconductor Lasers (AREA)
JP19473398A 1997-07-10 1998-07-09 Ｉｉｉ族窒化物光電子半導体装置 Pending JPH1174564A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9714468.7 1997-07-10
GB9714468A GB2327145A (en) 1997-07-10 1997-07-10 Graded layers in an optoelectronic semiconductor device

Publications (2)

Publication Number Publication Date
JPH1174564A true JPH1174564A (ja) 1999-03-16
JPH1174564A5 JPH1174564A5 (enExample) 2005-03-10

Family

ID=10815606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19473398A Pending JPH1174564A (ja) 1997-07-10 1998-07-09 Ｉｉｉ族窒化物光電子半導体装置

Country Status (5)

Country Link
US (1) US6072189A (enExample)
EP (1) EP0890997B1 (enExample)
JP (1) JPH1174564A (enExample)
DE (1) DE69838313T2 (enExample)
GB (1) GB2327145A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005020396A1 (ja) * 2003-08-26 2005-03-03 Sony Corporation ＧａＮ系ＩＩＩ−Ｖ族化合物半導体発光素子及びその製造方法
JP2005217059A (ja) * 2004-01-28 2005-08-11 Sumitomo Electric Ind Ltd 半導体素子
JP2006210692A (ja) * 2005-01-28 2006-08-10 Toyoda Gosei Co Ltd ３族窒化物系化合物半導体発光素子
JP2006352060A (ja) * 2004-10-29 2006-12-28 Philips Lumileds Lightng Co Llc 漸変組成の発光層を有する半導体発光装置
JP2010251811A (ja) * 2010-08-11 2010-11-04 Sumitomo Electric Ind Ltd 半導体素子

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6695913B1 (en) * 1997-07-10 2004-02-24 Sharp Kabushiki Kaisha III-Nitride optoelectronic semiconductor device containing lattice mismatched III-Nitride semiconductor materials
JP3420028B2 (ja) * 1997-07-29 2003-06-23 株式会社東芝 ＧａＮ系化合物半導体素子の製造方法
GB2331307A (en) * 1997-11-15 1999-05-19 Sharp Kk Growth of buffer layer by molecular beam epitaxy
JP2000261035A (ja) * 1999-03-12 2000-09-22 Toyoda Gosei Co Ltd ＧａＮ系の半導体素子
JP2000349393A (ja) * 1999-03-26 2000-12-15 Fuji Xerox Co Ltd 半導体デバイス、面発光型半導体レーザ、及び端面発光型半導体レーザ
JP4750238B2 (ja) * 1999-06-04 2011-08-17 ソニー株式会社 半導体発光素子
GB9913950D0 (en) * 1999-06-15 1999-08-18 Arima Optoelectronics Corp Unipolar light emitting devices based on iii-nitride semiconductor superlattices
US7473316B1 (en) * 2000-04-12 2009-01-06 Aixtron Ag Method of growing nitrogenous semiconductor crystal materials
GB2362263A (en) * 2000-05-12 2001-11-14 Juses Chao Amorphous and polycrystalline growth of gallium nitride-based semiconductors
US6707074B2 (en) * 2000-07-04 2004-03-16 Matsushita Electric Industrial Co., Ltd. Semiconductor light-emitting device and apparatus for driving the same
JP2002075880A (ja) * 2000-09-01 2002-03-15 Sanyo Electric Co Ltd 窒化物系半導体層の形成方法および窒化物系半導体素子の製造方法
US6534797B1 (en) 2000-11-03 2003-03-18 Cree, Inc. Group III nitride light emitting devices with gallium-free layers
US6800876B2 (en) 2001-01-16 2004-10-05 Cree, Inc. Group III nitride LED with undoped cladding layer (5000.137)
US6906352B2 (en) 2001-01-16 2005-06-14 Cree, Inc. Group III nitride LED with undoped cladding layer and multiple quantum well
USRE46589E1 (en) 2001-01-16 2017-10-24 Cree, Inc. Group III nitride LED with undoped cladding layer and multiple quantum well
US6576932B2 (en) 2001-03-01 2003-06-10 Lumileds Lighting, U.S., Llc Increasing the brightness of III-nitride light emitting devices
JP3876649B2 (ja) * 2001-06-05 2007-02-07 ソニー株式会社 窒化物半導体レーザ及びその製造方法
US6833564B2 (en) * 2001-11-02 2004-12-21 Lumileds Lighting U.S., Llc Indium gallium nitride separate confinement heterostructure light emitting devices
US7030428B2 (en) * 2001-12-03 2006-04-18 Cree, Inc. Strain balanced nitride heterojunction transistors
US6813296B2 (en) * 2002-04-25 2004-11-02 Massachusetts Institute Of Technology GaSb-clad mid-infrared semiconductor laser
US6841001B2 (en) * 2002-07-19 2005-01-11 Cree, Inc. Strain compensated semiconductor structures and methods of fabricating strain compensated semiconductor structures
US6835957B2 (en) * 2002-07-30 2004-12-28 Lumileds Lighting U.S., Llc III-nitride light emitting device with p-type active layer
US6815241B2 (en) * 2002-09-25 2004-11-09 Cao Group, Inc. GaN structures having low dislocation density and methods of manufacture
DE10260937A1 (de) * 2002-12-20 2004-07-08 Technische Universität Braunschweig Strahlungssemittierender Halbleiterkörper und Verfahren zu dessen Herstellung
JP4377600B2 (ja) * 2003-03-24 2009-12-02 株式会社東芝 ３族窒化物半導体の積層構造、その製造方法、及び３族窒化物半導体装置
JP4588380B2 (ja) * 2003-08-18 2010-12-01 ローム株式会社 半導体発光素子
KR101216622B1 (ko) * 2004-11-01 2012-12-31 더 리전츠 오브 더 유니버시티 오브 캘리포니아 매우 낮은 직렬-저항 및 개선된 히트 싱킹을 가진 발광소자 제조용의 상호 맞물린 멀티-픽셀 어레이
KR100752007B1 (ko) * 2005-01-28 2007-08-28 도요다 고세이 가부시키가이샤 3족 질화물계 화합물 반도체 발광 소자 및 그 제조 방법
DE102005048196B4 (de) * 2005-07-29 2023-01-26 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Strahlungsemittierender Halbleiterchip
JP2007048869A (ja) * 2005-08-09 2007-02-22 Sony Corp ＧａＮ系半導体発光素子の製造方法
US20070045638A1 (en) 2005-08-24 2007-03-01 Lumileds Lighting U.S., Llc III-nitride light emitting device with double heterostructure light emitting region
TWI364118B (en) * 2007-06-29 2012-05-11 Huga Optotech Inc Semiconductor structure combination for epitaxy of semiconductor optoelectronic device and manufactur thereof
KR101479623B1 (ko) * 2008-07-22 2015-01-08 삼성전자주식회사 질화물 반도체 발광소자
DE102017119931A1 (de) * 2017-08-30 2019-02-28 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterbauelement

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5003548A (en) * 1988-09-21 1991-03-26 Cornell Research Foundation, Inc. High power (1,4 W)AlGaInP graded-index separate confinement heterostructure visible (λ-658 nm) laser
DE68920853T2 (de) * 1988-11-28 1995-05-24 Fujitsu Ltd Verfahren für das Wachstum von epitaxialen Schichten.
US5646953A (en) * 1994-04-06 1997-07-08 Matsushita Electronics Corporation Semiconductor laser device
US5592501A (en) * 1994-09-20 1997-01-07 Cree Research, Inc. Low-strain laser structures with group III nitride active layers
JPH08264833A (ja) * 1995-03-10 1996-10-11 Hewlett Packard Co <Hp> 発光ダイオード
US5625202A (en) * 1995-06-08 1997-04-29 University Of Central Florida Modified wurtzite structure oxide compounds as substrates for III-V nitride compound semiconductor epitaxial thin film growth
JPH0918083A (ja) * 1995-07-03 1997-01-17 Gijutsu Kenkyu Kumiai Shinjoho Shiyori Kaihatsu Kiko 面発光半導体レーザ

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005020396A1 (ja) * 2003-08-26 2005-03-03 Sony Corporation ＧａＮ系ＩＩＩ−Ｖ族化合物半導体発光素子及びその製造方法
JP2005217059A (ja) * 2004-01-28 2005-08-11 Sumitomo Electric Ind Ltd 半導体素子
JP2006352060A (ja) * 2004-10-29 2006-12-28 Philips Lumileds Lightng Co Llc 漸変組成の発光層を有する半導体発光装置
JP2006210692A (ja) * 2005-01-28 2006-08-10 Toyoda Gosei Co Ltd ３族窒化物系化合物半導体発光素子
JP2010251811A (ja) * 2010-08-11 2010-11-04 Sumitomo Electric Ind Ltd 半導体素子

Also Published As

Publication number Publication date
EP0890997B1 (en) 2007-08-29
GB2327145A (en) 1999-01-13
DE69838313D1 (de) 2007-10-11
DE69838313T2 (de) 2008-05-21
EP0890997A3 (en) 1999-11-03
US6072189A (en) 2000-06-06
GB9714468D0 (en) 1997-09-17
EP0890997A2 (en) 1999-01-13

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