JPH1165094A - 収納ケース、露光装置及びデバイス製造装置 - Google Patents

収納ケース、露光装置及びデバイス製造装置

Info

Publication number
JPH1165094A
JPH1165094A JP24027697A JP24027697A JPH1165094A JP H1165094 A JPH1165094 A JP H1165094A JP 24027697 A JP24027697 A JP 24027697A JP 24027697 A JP24027697 A JP 24027697A JP H1165094 A JPH1165094 A JP H1165094A
Authority
JP
Japan
Prior art keywords
storage case
original plate
inert gas
reticle
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24027697A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1165094A5 (enExample
Inventor
Yutaka Endo
豊 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP24027697A priority Critical patent/JPH1165094A/ja
Publication of JPH1165094A publication Critical patent/JPH1165094A/ja
Publication of JPH1165094A5 publication Critical patent/JPH1165094A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP24027697A 1997-08-22 1997-08-22 収納ケース、露光装置及びデバイス製造装置 Pending JPH1165094A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24027697A JPH1165094A (ja) 1997-08-22 1997-08-22 収納ケース、露光装置及びデバイス製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24027697A JPH1165094A (ja) 1997-08-22 1997-08-22 収納ケース、露光装置及びデバイス製造装置

Publications (2)

Publication Number Publication Date
JPH1165094A true JPH1165094A (ja) 1999-03-05
JPH1165094A5 JPH1165094A5 (enExample) 2006-06-15

Family

ID=17057091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24027697A Pending JPH1165094A (ja) 1997-08-22 1997-08-22 収納ケース、露光装置及びデバイス製造装置

Country Status (1)

Country Link
JP (1) JPH1165094A (enExample)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002069379A1 (en) * 2001-02-26 2002-09-06 Nikon Corporation X-ray reflective mask, method of protecting the reflective mask, x-ray exposure device, and method of manufacturing semiconductor device
JP2003203859A (ja) * 2001-12-18 2003-07-18 Jenoptik Laser Optik Systeme Gmbh 少なくとも１つの光学要素を保管し搬送するための装置
WO2003079419A1 (en) * 2002-03-15 2003-09-25 Nikon Corporation Mask storage device, exposure device, and device manufacturing method
JP2005311360A (ja) * 2004-04-21 2005-11-04 Alcatel 熱泳動効果によって保護される搬送ポッド
JP2005311361A (ja) * 2004-04-21 2005-11-04 Alcatel 制御雰囲気下で基板を輸送するための装置
JP2006165579A (ja) * 2004-12-09 2006-06-22 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2007500869A (ja) * 2003-08-01 2007-01-18 カール・ツァイス・エスエムティー・アーゲー 少なくとも１つのシステム絞りを備えた光学結像装置
JP2011221538A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
CN104008987A (zh) * 2007-11-15 2014-08-27 株式会社尼康 掩模盒、搬送装置、曝光装置、掩模搬送方法及器件制造方法
WO2022252290A1 (zh) * 2021-06-01 2022-12-08 长鑫存储技术有限公司 光罩保护盒及光罩传送设备
WO2023000470A1 (zh) * 2021-07-19 2023-01-26 长鑫存储技术有限公司 光罩盒及半导体设备
US12125726B2 (en) 2021-07-19 2024-10-22 Changxin Memory Technologies, Inc. Mask pod and semiconductor device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002069379A1 (en) * 2001-02-26 2002-09-06 Nikon Corporation X-ray reflective mask, method of protecting the reflective mask, x-ray exposure device, and method of manufacturing semiconductor device
JP2003203859A (ja) * 2001-12-18 2003-07-18 Jenoptik Laser Optik Systeme Gmbh 少なくとも１つの光学要素を保管し搬送するための装置
WO2003079419A1 (en) * 2002-03-15 2003-09-25 Nikon Corporation Mask storage device, exposure device, and device manufacturing method
JP2007500869A (ja) * 2003-08-01 2007-01-18 カール・ツァイス・エスエムティー・アーゲー 少なくとも１つのシステム絞りを備えた光学結像装置
JP2005311360A (ja) * 2004-04-21 2005-11-04 Alcatel 熱泳動効果によって保護される搬送ポッド
JP2005311361A (ja) * 2004-04-21 2005-11-04 Alcatel 制御雰囲気下で基板を輸送するための装置
JP2006165579A (ja) * 2004-12-09 2006-06-22 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
CN104008987A (zh) * 2007-11-15 2014-08-27 株式会社尼康 掩模盒、搬送装置、曝光装置、掩模搬送方法及器件制造方法
JP2011221538A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
JP2015143873A (ja) * 2010-04-13 2015-08-06 株式会社ニコン マスクケース、露光装置、基板処理装置及びデバイス製造方法
WO2022252290A1 (zh) * 2021-06-01 2022-12-08 长鑫存储技术有限公司 光罩保护盒及光罩传送设备
WO2023000470A1 (zh) * 2021-07-19 2023-01-26 长鑫存储技术有限公司 光罩盒及半导体设备
US12125726B2 (en) 2021-07-19 2024-10-22 Changxin Memory Technologies, Inc. Mask pod and semiconductor device

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